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公开(公告)号:CN106457383B
公开(公告)日:2019-06-28
申请号:CN201580026546.7
申请日:2015-04-10
Applicant: 阿尔法装配解决方案公司
CPC classification number: H01L24/29 , B22F1/0003 , B22F1/0014 , B22F1/0074 , B22F1/025 , B22F7/04 , B22F2007/047 , B22F2301/255 , B22F2302/45 , B23K1/0016 , B23K35/025 , B23K35/3006 , B23K35/3601 , B23K35/3613 , B23K35/3618 , B23K35/365 , B23K2101/40 , B23K2103/56 , H01B1/22 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/27 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/81 , H01L24/83 , H01L24/92 , H01L25/50 , H01L51/5246 , H01L2224/0401 , H01L2224/04026 , H01L2224/05155 , H01L2224/05644 , H01L2224/11003 , H01L2224/1132 , H01L2224/11334 , H01L2224/131 , H01L2224/13339 , H01L2224/13347 , H01L2224/13355 , H01L2224/13387 , H01L2224/1339 , H01L2224/13439 , H01L2224/1349 , H01L2224/13499 , H01L2224/16227 , H01L2224/27003 , H01L2224/271 , H01L2224/27332 , H01L2224/27436 , H01L2224/27505 , H01L2224/2929 , H01L2224/29339 , H01L2224/29347 , H01L2224/29355 , H01L2224/29387 , H01L2224/2939 , H01L2224/29439 , H01L2224/2949 , H01L2224/29499 , H01L2224/32145 , H01L2224/32146 , H01L2224/32225 , H01L2224/32245 , H01L2224/48227 , H01L2224/48247 , H01L2224/73265 , H01L2224/81075 , H01L2224/81192 , H01L2224/81203 , H01L2224/8121 , H01L2224/8184 , H01L2224/81948 , H01L2224/83075 , H01L2224/83191 , H01L2224/83192 , H01L2224/83203 , H01L2224/8321 , H01L2224/83439 , H01L2224/83447 , H01L2224/8384 , H01L2224/83948 , H01L2224/92247 , H01L2224/94 , H01L2924/00014 , H01L2924/0665 , H01L2924/12041 , H01L2924/12044 , H01L2924/1461 , H01L2924/20102 , H01L2924/20103 , H01L2924/20104 , H01L2924/20105 , H01L2924/20106 , H01L2924/20107 , H01L2924/20108 , H01L2924/20109 , H01L2924/2011 , H01L2924/206 , H01L2924/2064 , H05K3/321 , H01L2924/00012 , H01L2224/83 , H01L2924/0105 , H01L2924/01046 , H01L2924/01047 , H01L2924/01029 , H01L2924/01028 , H01L2924/0103 , H01L2924/0493 , H01L2924/01004 , H01L2224/27 , H01L2924/01074 , H01L2224/81 , H01L2224/11436 , H01L2224/11 , H01L2224/45099 , H01L2924/00
Abstract: 一种烧结粉末,其包含:具有从100nm至50μm的平均最长尺寸的第一类型的金属颗粒。
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公开(公告)号:CN105931954A
公开(公告)日:2016-09-07
申请号:CN201610104398.2
申请日:2016-02-25
Applicant: 株式会社日立功率半导体
CPC classification number: H02M7/537 , H01L21/283 , H01L21/78 , H01L23/4827 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/13 , H01L24/14 , H01L24/16 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/33 , H01L24/81 , H01L24/83 , H01L24/92 , H01L24/94 , H01L25/0657 , H01L25/16 , H01L25/50 , H01L29/45 , H01L2224/0345 , H01L2224/03462 , H01L2224/039 , H01L2224/03901 , H01L2224/0401 , H01L2224/04026 , H01L2224/05083 , H01L2224/05124 , H01L2224/05166 , H01L2224/05558 , H01L2224/05624 , H01L2224/05655 , H01L2224/06181 , H01L2224/13022 , H01L2224/13387 , H01L2224/1403 , H01L2224/14131 , H01L2224/14135 , H01L2224/14154 , H01L2224/14177 , H01L2224/16145 , H01L2224/16238 , H01L2224/29147 , H01L2224/29387 , H01L2224/32227 , H01L2224/32245 , H01L2224/33181 , H01L2224/81447 , H01L2224/8184 , H01L2224/83065 , H01L2224/83203 , H01L2224/83447 , H01L2224/8384 , H01L2224/92 , H01L2224/94 , H01L2225/06513 , H01L2225/06517 , H01L2924/01013 , H01L2924/1203 , H01L2924/13055 , H01L2924/3511 , H02M7/003 , H01L2924/00014 , H01L2924/01014 , H01L2224/03 , H01L2924/0541 , H01L2924/01029 , H01L2924/00012 , H01L2224/1413 , H01L2224/1415 , H01L2224/03464 , H01L21/304 , H01L21/22 , H01L21/28 , H02M7/00
Abstract: 本发明提供能减低成膜的Ni电极膜的膜缺损的半导体装置、半导体装置的制造方法以及电力变换装置。半导体装置(100)在形成半导体元件(150)的半导体基板(108)的n+型半导体层(108c)的第1表面(108d)具备:第1半导体芯片的电极结构体(151),其与该半导体元件(150)电连接,按照Al或Al合金所构成的第1Al金属层(105)、Cu扩散防止层(107)、Al或Al合金所构成的第2Al金属层(106)、以及Ni层(104)的顺序将它们形成;和导电构件(102),其配置在Ni层(104)的表面(104a),经由铜烧结层(103)与第1半导体芯片的电极结构体(151)接合,第2Al金属层(106)的表面(106a)的Al晶粒的结晶面方位主要为(110)面。
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公开(公告)号:CN104205312A
公开(公告)日:2014-12-10
申请号:CN201380017110.2
申请日:2013-03-21
Applicant: 田中贵金属工业株式会社
CPC classification number: H01L24/83 , B22F1/0074 , B22F1/025 , B23K1/203 , B23K35/0222 , B23K35/0244 , B23K35/025 , B23K35/226 , B23K35/3006 , B23K35/3013 , B23K35/302 , B23K35/322 , B23K2101/40 , H01B1/22 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/81 , H01L2224/0401 , H01L2224/04026 , H01L2224/05082 , H01L2224/05166 , H01L2224/05169 , H01L2224/05644 , H01L2224/11312 , H01L2224/11318 , H01L2224/1132 , H01L2224/11416 , H01L2224/13294 , H01L2224/13339 , H01L2224/13347 , H01L2224/13364 , H01L2224/13444 , H01L2224/16227 , H01L2224/27312 , H01L2224/27318 , H01L2224/2732 , H01L2224/27416 , H01L2224/29294 , H01L2224/29339 , H01L2224/29347 , H01L2224/29364 , H01L2224/29444 , H01L2224/32225 , H01L2224/81192 , H01L2224/81203 , H01L2224/81444 , H01L2224/8184 , H01L2224/83192 , H01L2224/83203 , H01L2224/83444 , H01L2224/8384 , H01L2924/01029 , H01L2924/01046 , H01L2924/01047 , H01L2924/01079 , H01L2924/01203 , H01L2924/014 , H01L2924/10253 , H01L2924/15747 , H01L2924/351 , H01L2924/00 , H01L2924/00014 , H01L2924/00012
Abstract: 本发明为一种导电性糊,其为由金属粉末和有机溶剂构成的芯片接合用导电性糊,其中,所述金属粉末由选自纯度为99.9质量%以上、平均粒径为0.01μm~1.0μm的银粉、钯粉、铜粉中的一种以上的金属粒子和包覆所述金属粒子的至少一部分的由金构成的包覆层构成。根据本发明的导电性糊,在将半导体元件等往衬底上进行芯片接合时,能够抑制在接合部产生空隙等缺陷。
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公开(公告)号:CN102812543A
公开(公告)日:2012-12-05
申请号:CN201180014602.7
申请日:2011-03-18
Applicant: 古河电气工业株式会社
IPC: H01L21/60
CPC classification number: H01L23/4924 , H01L21/4853 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/81 , H01L24/83 , H01L2224/0401 , H01L2224/04026 , H01L2224/05166 , H01L2224/05644 , H01L2224/1132 , H01L2224/1134 , H01L2224/1147 , H01L2224/13082 , H01L2224/13294 , H01L2224/13305 , H01L2224/13309 , H01L2224/13311 , H01L2224/13313 , H01L2224/13316 , H01L2224/13317 , H01L2224/13318 , H01L2224/1332 , H01L2224/13323 , H01L2224/13324 , H01L2224/13339 , H01L2224/13344 , H01L2224/13347 , H01L2224/13349 , H01L2224/13355 , H01L2224/13357 , H01L2224/13364 , H01L2224/13366 , H01L2224/13369 , H01L2224/1601 , H01L2224/16227 , H01L2224/16245 , H01L2224/2732 , H01L2224/2747 , H01L2224/29294 , H01L2224/29305 , H01L2224/29309 , H01L2224/29311 , H01L2224/29313 , H01L2224/29316 , H01L2224/29317 , H01L2224/29318 , H01L2224/2932 , H01L2224/29323 , H01L2224/29324 , H01L2224/29339 , H01L2224/29344 , H01L2224/29347 , H01L2224/29349 , H01L2224/29355 , H01L2224/29357 , H01L2224/29364 , H01L2224/29366 , H01L2224/29369 , H01L2224/3201 , H01L2224/32227 , H01L2224/32245 , H01L2224/81075 , H01L2224/81125 , H01L2224/81127 , H01L2224/81191 , H01L2224/81192 , H01L2224/81193 , H01L2224/81203 , H01L2224/81447 , H01L2224/8184 , H01L2224/83075 , H01L2224/83125 , H01L2224/83127 , H01L2224/83191 , H01L2224/83192 , H01L2224/83203 , H01L2224/83447 , H01L2224/8384 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01009 , H01L2924/01012 , H01L2924/01013 , H01L2924/01019 , H01L2924/01021 , H01L2924/01022 , H01L2924/01025 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01051 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10253 , H01L2924/12042 , H01L2924/15787 , H01L2924/351 , H05K2203/0338 , H01L2924/00 , H01L2924/00012 , H01L2924/00014
Abstract: 本发明提供由热循环特性优异的金属多孔质体构成的导电性凸块、导电性芯片焊接部等导电连接部件。所述导电连接部件在半导体元件的电极端子或电路基板的电极端子的接合面形成,其特征在于,该导电连接部件是对包含平均一次粒径为10nm~500nm的金属微粒(P)和有机溶剂(S)或者由有机溶剂(S)与有机粘结剂(R)构成的有机分散介质(D)的导电性糊料进行加热处理而使金属微粒彼此结合所形成的金属多孔质体,该金属多孔质体的空隙率为5体积%~35体积%,构成该金属多孔质体的金属微粒的平均粒径为10nm~500nm的范围,且存在于该金属微粒间的平均空穴直径为1nm~200nm的范围。
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公开(公告)号:CN102812520A
公开(公告)日:2012-12-05
申请号:CN201180014310.3
申请日:2011-03-18
Applicant: 古河电气工业株式会社
CPC classification number: B23K35/0244 , H01B1/22 , H01L21/4853 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/81 , H01L24/83 , H01L2224/0345 , H01L2224/0401 , H01L2224/04026 , H01L2224/05644 , H01L2224/1132 , H01L2224/1329 , H01L2224/133 , H01L2224/16225 , H01L2224/16227 , H01L2224/16505 , H01L2224/2732 , H01L2224/29101 , H01L2224/2929 , H01L2224/293 , H01L2224/32225 , H01L2224/32505 , H01L2224/45144 , H01L2224/48227 , H01L2224/48644 , H01L2224/81121 , H01L2224/81191 , H01L2224/81192 , H01L2224/81203 , H01L2224/8184 , H01L2224/83191 , H01L2224/83192 , H01L2224/83203 , H01L2224/8384 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10253 , H01L2924/12042 , H01L2924/15747 , H01L2924/35121 , H05K3/3484 , H01L2924/00014 , H01L2924/00 , H01L2924/3512
Abstract: 本发明提供导电性糊料,其用于形成空穴(空隙)的不均匀分布少、不存在粗大空隙和裂纹、热循环特性提高、且抗裂性和接合强度优异的导电连接部件。一种导电性糊料,其特征在于,其包含50质量%~85质量%的金属微粒(P)和50质量%~15质量%的由有机溶剂(S)构成或者由有机溶剂(S)与有机粘结剂(B)构成的有机分散介质(D)(质量%的合计为100质量%),所述金属微粒(P)由金属微粒(P1)和金属微粒(P2)构成,所述金属微粒(P1)由选自金属和合金的1种或2种以上构成且平均一次粒径为1nm~150nm,所述金属微粒(P2)与金属微粒(P1)为同种金属且平均一次粒径为1μm~10μm,其混配比例(P1/P2)为80质量%~95质量%/20质量%~5质量%(质量%的合计为100质量%)。
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公开(公告)号:CN101933129B
公开(公告)日:2012-03-28
申请号:CN200880126141.0
申请日:2008-12-25
Applicant: 株式会社村田制作所
CPC classification number: H01L23/295 , H01L24/11 , H01L24/13 , H01L24/81 , H01L24/97 , H01L2224/0401 , H01L2224/05573 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/06102 , H01L2224/1131 , H01L2224/13294 , H01L2224/13339 , H01L2224/13344 , H01L2224/13347 , H01L2224/13355 , H01L2224/141 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/81055 , H01L2224/81191 , H01L2224/81192 , H01L2224/81193 , H01L2224/81194 , H01L2224/81203 , H01L2224/8184 , H01L2224/97 , H01L2924/00013 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01079 , H01L2924/01082 , H01L2924/181 , H05K3/321 , H05K2201/0257 , H05K2201/10674 , H05K2203/1131 , H01L2924/00 , H01L2224/81 , H01L2224/29099 , H01L2924/00012 , H01L2924/00014 , H01L2924/013 , H01L2924/01014
Abstract: 提供一种制造将芯片元件等安装在布线基板上的电子元件装置的方法,该方法生产效率高、能够降低成本、具有稳定的产品质量。把金属纳米粒子浆(1)施加在基板侧电极(23)上;在布线基板(22)和芯片元件(26)对好位置的状态下,施加负荷(30),由此使金属纳米粒子浆(1)一直压缩变形到压缩变形极限厚度(31);接着,加热金属纳米粒子浆(1),由此得到烧结好金属纳米粒子的接合烧结体(6),从而将基板侧电极(23)与芯片侧电极(27)相互接合在一起。
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公开(公告)号:CN1819172A
公开(公告)日:2006-08-16
申请号:CN200610001670.0
申请日:2006-01-20
IPC: H01L23/488 , H01L21/60 , B23K35/00
CPC classification number: H01L24/32 , H01L23/3735 , H01L23/3736 , H01L24/29 , H01L24/83 , H01L2224/04026 , H01L2224/2908 , H01L2224/29101 , H01L2224/29111 , H01L2224/29139 , H01L2224/29339 , H01L2224/29344 , H01L2224/29369 , H01L2224/32245 , H01L2224/8184 , H01L2224/83801 , H01L2224/8384 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/01322 , H01L2924/014 , H01L2924/10253 , H01L2924/10272 , H01L2924/10329 , H01L2924/19043 , H01L2924/00 , H01L2924/01014 , H01L2924/00014 , H01L2924/3512
Abstract: 一种半导体装置及其制造方法,包括:制备表面上有由第一金属制成的第一金属层的半导体元件、和由第二金属制成的金属衬底,金属衬底的表面具有由第四金属制成的第四金属层,半导体元件安装在其表面上;在第一和第四金属层间提供通过将平均直径为100nm或更小的由第三金属制成的细颗粒分散到有机溶剂中形成的金属纳米膏;对其间有金属纳米膏的半导体元件和金属衬底加热或加热并加压,以去除溶剂。第一、第三和第四金属的每种由金、银、铂、铜、镍、铬、铁、铅、钴中任一种、包含至少一种这些金属的合金、或这些金属或合金的混合物制成。通过该方法,能将半导体元件良好地接合到金属衬底上。
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公开(公告)号:CN103377950B
公开(公告)日:2017-03-01
申请号:CN201310148433.7
申请日:2013-04-25
Applicant: 赛米控电子股份有限公司
Inventor: 库尔特-格奥尔格·贝森德费 , 海科·布拉姆尔 , 娜蒂娅·埃德纳 , 克里斯蒂安·约布尔 , 哈拉尔德·科波拉
IPC: H01L21/48 , H01L21/60 , H01L23/498 , H01L25/16
CPC classification number: H01L23/49844 , H01L21/4846 , H01L23/14 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/81 , H01L24/83 , H01L25/072 , H01L25/167 , H01L2224/13111 , H01L2224/13339 , H01L2224/16225 , H01L2224/29111 , H01L2224/29339 , H01L2224/32225 , H01L2224/81801 , H01L2224/8184 , H01L2224/83801 , H01L2224/8384 , H01L2924/1301 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/15787 , H01L2924/00
Abstract: 本发明涉及一种基底和用于制造至少一个功率半导体器件的基底的方法,该方法具有如下方法步骤:a)提供不导电的绝缘材料体(1);b)将结构化的导电的第一金属化层(2a)施布在绝缘材料体(1)的第一侧(15a)上,其中,第一金属化层(2a)具有第一和第二区域(22a、22b),其中,第一区域(22a)具有窄导体轨迹(21),而第二区域22b)具有至少一个宽导体轨迹(20a、20b);以及c)在至少一个宽导体轨迹(20a、20b)上电沉积第一金属层(5)。本发明提供一种基底(7),该基底不仅具有至少一个能承载负载电流的导体轨迹25)而且还具有能与集成电路连接的导体轨迹21)。
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公开(公告)号:CN102812520B
公开(公告)日:2016-10-19
申请号:CN201180014310.3
申请日:2011-03-18
Applicant: 古河电气工业株式会社
CPC classification number: B23K35/0244 , H01B1/22 , H01L21/4853 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/81 , H01L24/83 , H01L2224/0345 , H01L2224/0401 , H01L2224/04026 , H01L2224/05644 , H01L2224/1132 , H01L2224/1329 , H01L2224/133 , H01L2224/16225 , H01L2224/16227 , H01L2224/16505 , H01L2224/2732 , H01L2224/29101 , H01L2224/2929 , H01L2224/293 , H01L2224/32225 , H01L2224/32505 , H01L2224/45144 , H01L2224/48227 , H01L2224/48644 , H01L2224/81121 , H01L2224/81191 , H01L2224/81192 , H01L2224/81203 , H01L2224/8184 , H01L2224/83191 , H01L2224/83192 , H01L2224/83203 , H01L2224/8384 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10253 , H01L2924/12042 , H01L2924/15747 , H01L2924/35121 , H05K3/3484 , H01L2924/00014 , H01L2924/00 , H01L2924/3512
Abstract: 本发明提供导电性糊料,其用于形成空穴(空隙)的不均匀分布少、不存在粗大空隙和裂纹、热循环特性提高、且抗裂性和接合强度优异的导电连接部件。一种导电性糊料,其特征在于,其包含50质量%~85质量%的金属微粒(P)和50质量%~15质量%的由有机溶剂(S)构成或者由有机溶剂(S)与有机粘结剂(B)构成的有机分散介质(D)(质量%的合计为100质量%),所述金属微粒(P)由金属微粒(P1)和金属微粒(P2)构成,所述金属微粒(P1)由选自金属和合金的1种或2种以上构成且平均一次粒径为1nm~150nm,所述金属微粒(P2)与金属微粒(P1)为同种金属且平均一次粒径为1μm~10μm,其混配比例(P1/P2)为80质量%~95质量%/20质量%~5质量%(质量%的合计为100质量%)。
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公开(公告)号:CN105789166A
公开(公告)日:2016-07-20
申请号:CN201610014083.9
申请日:2016-01-11
Applicant: 迈克纳斯公司
IPC: H01L23/495
CPC classification number: H01L23/49827 , H01L21/561 , H01L23/24 , H01L23/3107 , H01L23/3121 , H01L23/49541 , H01L23/49838 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/97 , H01L2224/04042 , H01L2224/05554 , H01L2224/16227 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48225 , H01L2224/48227 , H01L2224/48247 , H01L2224/73253 , H01L2224/73265 , H01L2224/81203 , H01L2224/81801 , H01L2224/8184 , H01L2224/83 , H01L2224/97 , H01L2924/00014 , H01L2924/14 , H01L2924/15156 , H01L2924/15313 , H01L2924/19105 , H01L2924/19106 , H01L2924/00012 , H01L2224/85 , H01L2224/81 , H01L2224/32245 , H01L2924/00 , H01L2224/85399 , H01L2224/05599 , H01L23/49517
Abstract: 本发明涉及具有一个半导体主体的集成电路壳体(IC-壳体),其中半导体主体具有一个单片的集成电路及至少两个金属接触面,及该集成电路借助导体线路与两个电接触面连接以及半导体主体被设置在一个载体基底上且与该载体基底力锁合地连接,及该载体基底具有至少两个连接接触部及这两个连接接触部与两个接触面连接以及半导体主体与载体基底被一个浇注质量体覆盖,其中浇注质量体构成IC-壳体的一部分及两个连接接触部的各一区段穿过IC壳体,其中这两个连接接触部设置在载体基底上及每个连接接触部与位于相应的连接接触部下面的载体基底构成一个孔状构形,其中相应的孔状构形被构成穿通接触部,以便提供与另一电构件的电连接。
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