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公开(公告)号：CN102738106A
公开(公告)日：2012-10-17
申请号：CN201210182881.4
申请日：2007-05-22
IPC: H01L23/488 , H01L23/498 , H01L23/31 , H01L23/24
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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公开(公告)号：CN102738107A
公开(公告)日：2012-10-17
申请号：CN201210183161.X
申请日：2007-05-22
IPC: H01L23/488 , H01L23/498 , H01L23/31
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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公开(公告)号：CN102157458B
公开(公告)日：2012-10-17
申请号：CN201110042145.4
申请日：2007-05-22
IPC: H01L23/00 , H01L23/498 , H01L23/31
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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公开(公告)号：CN102157458A
公开(公告)日：2011-08-17
申请号：CN201110042145.4
申请日：2007-05-22
IPC: H01L23/00 , H01L23/498 , H01L23/31
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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公开(公告)号：CN101454887B
公开(公告)日：2011-03-23
申请号：CN200780019384.X
申请日：2007-05-22
IPC: H01L21/60 , H01L23/52 , H01L21/3205
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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Patent Agency Ranking
公开(公告)号：CN101395715A
公开(公告)日：2009-03-25
申请号：CN200780007945.4
申请日：2007-02-28
Applicant: 日本电气株式会社 , 恩益禧电子股份有限公司
CPC classification number: H01L23/4985 , H01L25/105 , H01L25/16 , H01L2224/16 , H01L2224/16225 , H01L2224/45144 , H01L2224/73253 , H01L2225/1005 , H01L2225/1023 , H01L2225/1041 , H01L2225/1058 , H01L2924/00014 , H01L2924/01015 , H01L2924/01047 , H01L2924/09701 , H01L2924/12044 , H01L2924/16251 , H01L2924/19105 , H01L2924/00 , H01L2224/48
Abstract: 提供一种电子器件封装等，其中内插器基板上的布线图形不容易在电子器件和插入基板之间形成的空间中损坏。所述半导体封装是扇出型封装，设有内插器基板(3)、半导体器件(1)以及安排在基板(3)上的插入基板(18)。内插器基板(3)内具有布线图形(6)。空间(8)形成在半导体器件(1)和插入基板(18)之间，在与空间对应的区域中，形成加强装置，例如金属膜(7)，用于增加布线图形(6)的强度。
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公开(公告)号：CN101454887A
公开(公告)日：2009-06-10
申请号：CN200780019384.X
申请日：2007-05-22
Applicant: 日本电气株式会社 , 恩益禧电子股份有限公司
IPC: H01L21/60 , H01L23/52 , H01L21/3205
CPC classification number: H01L23/49866 , H01L21/563 , H01L23/24 , H01L23/3128 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/75 , H01L24/81 , H01L2224/0345 , H01L2224/03462 , H01L2224/03464 , H01L2224/0362 , H01L2224/03828 , H01L2224/0401 , H01L2224/05073 , H01L2224/05082 , H01L2224/05083 , H01L2224/05084 , H01L2224/05118 , H01L2224/05147 , H01L2224/05155 , H01L2224/05157 , H01L2224/0516 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05571 , H01L2224/05647 , H01L2224/05655 , H01L2224/1132 , H01L2224/1145 , H01L2224/11462 , H01L2224/1147 , H01L2224/115 , H01L2224/11502 , H01L2224/1152 , H01L2224/11849 , H01L2224/13006 , H01L2224/13022 , H01L2224/13111 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/75702 , H01L2224/8121 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/83104 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/09701 , H01L2924/15311 , H01L2924/15787 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/3512 , H01L2924/3651 , H05K3/244 , H05K3/3436 , H05K3/3463 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
Abstract: 在常规UBM例如Cu、Ni或NiP中，存在的这样问题：在长时间将电子部件保持在高温条件下时导致UBM的阻挡特性被破坏，并且由于在结合界面形成脆性的合金层，导致结合强度降低。焊料连接部分在高温下储存之后长期连接可靠性降低的问题得到了解决。电子部件上提供有：安置在基板或半导体元件上的电极片；和为覆盖所述电极片而安置的阻挡金属层。所述阻挡金属层在与所述电极片接触侧相反的一侧上包含CuNi合金层，所述CuNi合金层含有15至60原子％的Cu和40至85原子％的Ni。
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公开(公告)号：CN100438024C
公开(公告)日：2008-11-26
申请号：CN200380100735.1
申请日：2003-11-19
Applicant: 日本电气株式会社
IPC: H01L25/065 , H01L25/07 , H01L25/18
CPC classification number: H01L23/3114 , H01L23/5387 , H01L24/97 , H01L25/105 , H01L2224/16225 , H01L2224/32145 , H01L2224/32225 , H01L2224/73253 , H01L2224/97 , H01L2225/06517 , H01L2225/1023 , H01L2225/1041 , H01L2225/1058 , H01L2924/01057 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/15311 , H01L2924/181 , H01L2224/81 , H01L2924/00
Abstract: 半导体封装是由半导体装置芯片和具有热可塑性的绝缘树脂层的可挠性基板构成的。设置在可挠性基板上的电极与上述半导体装置芯片规定的电极连接，并且由热可塑性绝缘树脂层密封，而且上述可挠性基板可弯曲，在电极形成面和其它面上设置电极。该可挠性基板中配线被多层化，在可挠性基板的弯曲部分或包含弯曲部分的区域形成槽，或者，形成配线层数不同的薄层部，在半导体装置安装部形成凹部。并且，在规定位置弯曲上述可挠性基板，形成不依赖上述半导体装置芯片的外形尺寸的半导体封装。
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公开(公告)号：CN101447464B
公开(公告)日：2012-09-19
申请号：CN200810178837.X
申请日：2008-12-01
Applicant: 日本电气株式会社
IPC: H01L23/02 , H01L23/10 , H01L21/50 , H01L21/52 , H01L31/0203 , H01L31/18 , H01L41/053 , H01L41/22 , G01J1/02
CPC classification number: H01L23/057 , B81C1/00285 , B81C2203/0145 , H01L23/047 , H01L24/45 , H01L24/48 , H01L27/14618 , H01L31/0203 , H01L2224/45015 , H01L2224/45124 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/09701 , H01L2924/12042 , H01L2924/16151 , H01L2924/16195 , H01L2924/00 , H01L2924/20753 , H01L2224/05599
Abstract: 本发明提供一种不产生大型化、密封不良及功能不良且实现高真空的真空包装及其制造方法。真空包装(100)具备：真空密封于室(6)内的红外线受光元件(1)和形成室(6)的红外线透过窗(12)、间隔件(9)及受光元件基板(3)。红外线透过窗(12)具有用于将室(6)内脱气贯通孔(13)，贯通孔(13)利用密封材料密封。形成贯通孔(13)的红外线透过窗(12)的角部为钝角。贯通孔(13)的内壁具有：自室(6)的外面侧向内面侧将贯通孔的开口面积缩小的第一锥形面、和自室(6)的内面侧向外面侧将贯通孔(13)的开口面积缩小的第二锥形面，第一锥形面形成在比第二锥形面更靠室(6)的外面侧。另外，密封材料(15)用的焊盘(14)只形成在贯通孔(13)的内壁中第一锥形面上。
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公开(公告)号：CN101286492B
公开(公告)日：2011-12-07
申请号：CN200810092146.8
申请日：2003-11-19
Applicant: 日本电气株式会社
IPC: H01L23/498 , H01L23/538 , H01L25/00
CPC classification number: H01L23/3114 , H01L23/5387 , H01L24/97 , H01L25/105 , H01L2224/16225 , H01L2224/32145 , H01L2224/32225 , H01L2224/73253 , H01L2224/97 , H01L2225/06517 , H01L2225/1023 , H01L2225/1041 , H01L2225/1058 , H01L2924/01057 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/15311 , H01L2924/181 , H01L2224/81 , H01L2924/00
Abstract: 半导体封装是由半导体装置芯片和具有热可塑性的绝缘树脂层的可挠性基板构成的。设置在可挠性基板上的电极与上述半导体装置芯片规定的电极连接，并且由热可塑性绝缘树脂层密封，而且上述可挠性基板可弯曲，在电极形成面和其它面上设置电极。该可挠性基板中配线被多层化，在可挠性基板的弯曲部分或包含弯曲部分的区域形成槽，或者，形成配线层数不同的薄层部，在半导体装置安装部形成凹部。并且，在规定位置弯曲上述可挠性基板，形成不依赖上述半导体装置芯片的外形尺寸的半导体封装。
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