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公开(公告)号:CN102687256A
公开(公告)日:2012-09-19
申请号:CN201080050375.9
申请日:2010-11-10
Applicant: 日立化成工业株式会社
IPC: H01L21/52 , H01L25/065 , H01L25/07 , H01L25/18
CPC classification number: H01L24/27 , H01L21/6836 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/83 , H01L25/0657 , H01L2221/68327 , H01L2224/274 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83855 , H01L2224/92247 , H01L2225/0651 , H01L2225/06568 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01015 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/01084 , H01L2924/04953 , H01L2924/0665 , H01L2924/07802 , H01L2924/09701 , H01L2924/10253 , H01L2924/12042 , H01L2924/12044 , H01L2924/15747 , H01L2924/181 , H01L2924/3025 , Y10T428/2809 , H01L2924/00014 , H01L2924/00 , H01L2924/3512 , H01L2924/00012
Abstract: 本发明的膜状粘接剂的制造方法,其特征在于,在基材上涂布溶剂的含量为5质量%以下且在25℃下为液状的粘接剂组合物而形成粘接剂组合物层,对该粘接剂组合物层进行光照射而形成膜状粘接剂,所述粘接剂组合物含有(A)放射线聚合性化合物、(B)光引发剂和(C)热固性树脂。
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公开(公告)号:CN102598233A
公开(公告)日:2012-07-18
申请号:CN201080050152.2
申请日:2010-11-10
Applicant: 日立化成工业株式会社
IPC: H01L21/52
CPC classification number: H01L24/27 , C08G73/10 , C09J179/08 , H01L24/29 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/83 , H01L25/0657 , H01L2224/274 , H01L2224/27416 , H01L2224/27418 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/8385 , H01L2224/92247 , H01L2225/0651 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01015 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01047 , H01L2924/01051 , H01L2924/01075 , H01L2924/01079 , H01L2924/01084 , H01L2924/04953 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/181 , H01L2924/00 , H01L2924/3512 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: 本发明的液状半导体用粘接剂组合物,其特征在于含有(A)放射线聚合性化合物、(B)光引发剂,以及(C)热固性树脂,并且其中(B)成分含有(B1)对波长为365nm的光的分子吸光系数为100ml/g·cm以上的化合物。
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公开(公告)号:CN102369147A
公开(公告)日:2012-03-07
申请号:CN201080014687.4
申请日:2010-04-06
Applicant: 日立化成工业株式会社
CPC classification number: B65D81/268
Abstract: 本发明提供一种粘接膜包装体100,其具备层叠体元件10和容纳层叠体元件10的包装容器20,所述层叠体元件10具有有着中空部的筒状卷芯和以卷状卷绕在该卷芯上的粘接膜;在中空部中具有干燥剂。
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公开(公告)号:CN102290334A
公开(公告)日:2011-12-21
申请号:CN201110153300.X
申请日:2006-06-30
Applicant: 日立化成工业株式会社
IPC: H01L21/20 , H01L21/762 , H01L27/146
CPC classification number: H01L23/488 , C09J179/08 , G03F7/037 , H01L21/2007 , H01L21/76251 , H01L21/78 , H01L27/14618 , H01L27/14683 , H01L2224/48091 , Y10T156/1002 , Y10T428/24479 , Y10T428/24802 , H01L2924/00014
Abstract: 本发明涉及一种半导体装置的制造方法。该半导体装置的制造方法,其包括:粘接剂层形成工序:通过把粘接薄膜贴附在半导体晶圆上,在所述半导体晶圆上形成粘接剂层;粘接剂图案形成工序:通过对该粘接剂层进行曝光和显影处理,形成粘接剂图案;粘接工序:隔着所述粘接剂图案将被粘接物粘接在所述半导体晶圆上。该半导体装置的制造方法可以用在较低温度下进行半导体装置的制造。
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公开(公告)号:CN102131882A
公开(公告)日:2011-07-20
申请号:CN200980132606.8
申请日:2009-08-26
Applicant: 日立化成工业株式会社
IPC: C09J201/00 , C09J4/02 , C09J7/00 , C09J7/02 , C09J163/00 , C09J179/08 , C09J201/06 , H01L21/52
CPC classification number: C09J4/00 , C08G73/1042 , C08G73/1046 , C08G73/106 , C08G73/1082 , C08L63/00 , C08L79/08 , C08L2666/02 , C08L2666/20 , C08L2666/22 , C09J4/06 , C09J163/00 , C09J179/08 , G03F7/038 , G03F7/70383 , H01L21/6836 , H01L24/27 , H01L24/29 , H01L24/48 , H01L24/73 , H01L24/83 , H01L25/50 , H01L2224/16 , H01L2224/274 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83192 , H01L2224/83194 , H01L2224/83856 , H01L2224/92247 , H01L2225/06513 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01044 , H01L2924/01046 , H01L2924/01047 , H01L2924/0105 , H01L2924/01051 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/10253 , H01L2924/12041 , H01L2924/15788 , H01L2924/181 , H01L2924/351 , Y10T428/24355 , Y10T428/287 , Y10T428/31518 , H01L2924/00 , H01L2924/3512 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: 本发明涉及可以通过在被粘接物上形成粘接剂层并利用放射线施加曝光处理及利用显影液施加显影处理而形成粘接剂图案的感光性粘接剂组合物,上述感光性粘接剂组合物具有溶解显影性,并且显影后形成的上述粘接剂图案的膜厚T1(μm)满足下述式(1)所示的条件。(T1/T0)×100≥90...(1)[式(1)中,T0表示显影处理前的粘接剂层的膜厚(μm)。]。
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公开(公告)号:CN101218539B
公开(公告)日:2011-07-13
申请号:CN200680024508.9
申请日:2006-06-30
Applicant: 日立化成工业株式会社
IPC: G03F7/037 , C09J179/08 , C09J7/00 , G03F7/004
CPC classification number: H01L23/488 , C09J179/08 , G03F7/037 , H01L21/2007 , H01L21/76251 , H01L21/78 , H01L27/14618 , H01L27/14683 , H01L2224/48091 , Y10T156/1002 , Y10T428/24479 , Y10T428/24802 , H01L2924/00014
Abstract: 本发明关于一种感光性粘接剂组合物,其含有(A)具有羧基作为侧链、酸值为80~180mg/KOH的聚酰亚胺、(B)放射线聚合性化合物、及(C)光聚合引发剂。
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公开(公告)号:CN101884104A
公开(公告)日:2010-11-10
申请号:CN200880119113.6
申请日:2008-12-02
Applicant: 日立化成工业株式会社
IPC: H01L25/065 , C09J4/00 , C09J179/08 , H01L21/52 , H01L25/07 , H01L25/18
CPC classification number: C09J4/00 , C08G65/3322 , C08G65/33306 , C08G2650/50 , C08L71/02 , C08L79/08 , C08L2666/20 , C08L2666/22 , C09J171/02 , C09J179/08 , H01L21/6836 , H01L23/3121 , H01L24/27 , H01L24/29 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/85 , H01L2221/68327 , H01L2224/05554 , H01L2224/274 , H01L2224/2919 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83855 , H01L2224/85 , H01L2224/92247 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01015 , H01L2924/01019 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01047 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/04953 , H01L2924/0665 , H01L2924/07802 , H01L2924/181 , H01L2924/351 , H01L2924/00 , H01L2924/00012 , H01L2224/45015 , H01L2924/207 , H01L2224/45099
Abstract: 本发明的感光性粘接剂,其是通过曝光及显影来形成图案后对于被粘接物具有粘接性、可以碱显影的感光性粘接剂,用于具有以下工序的半导体装置100的制造方法,所述工序是:通过曝光及显影将设置于半导体芯片20的电路面上的感光性粘接剂1形成图案的工序,和将其他的半导体芯片21与形成图案后的所述感光性粘接剂1直接粘接的工序。
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