Invention Grant
US09252328B2 Three-dimensional gallium nitride (GaN) pillar structure light emitting diode (LED)
有权
三维氮化镓(GaN)柱结构发光二极管(LED)
- Patent Title: Three-dimensional gallium nitride (GaN) pillar structure light emitting diode (LED)
- Patent Title (中): 三维氮化镓(GaN)柱结构发光二极管(LED)
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Application No.: US14671793Application Date: 2015-03-27
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Publication No.: US09252328B2Publication Date: 2016-02-02
- Inventor: Mark Albert Crowder , Changqing Zhan , Paul J. Schuele
- Applicant: Sharp Laboratories of America, Inc.
- Applicant Address: US WA Camas
- Assignee: Sharp Laboratories of America, Inc.
- Current Assignee: Sharp Laboratories of America, Inc.
- Current Assignee Address: US WA Camas
- Agency: Law Office of Gerald Maliszewski
- Agent Gerald Maliszewski
- Main IPC: H01L33/24
- IPC: H01L33/24 ; H01L33/18 ; H01L33/32 ; H01L33/00 ; H01L33/04 ; H01L33/06 ; H01L33/08 ; H01L33/42

Abstract:
A method is provided for fabricating a light emitting diode (LED) using three-dimensional gallium nitride (GaN) pillar structures with planar surfaces. The method forms a plurality of GaN pillar structures, each with an n-doped GaN (n-GaN) pillar and planar sidewalls perpendicular to the c-plane, formed in either an m-plane or a-plane family. A multiple quantum well (MQW) layer is formed overlying the n-GaN pillar sidewalls, and a layer of p-doped GaN (p-GaN) is formed overlying the MQW layer. The plurality of GaN pillar structures are deposited on a first substrate, with the n-doped GaN pillar sidewalls aligned parallel to a top surface of the first substrate. A first end of each GaN pillar structure is connected to a first metal layer. The second end of each GaN pillar structure is etched to expose the n-GaN pillar second end and connected to a second metal layer.
Public/Granted literature
- US20150221827A1 Three-Dimensional Gallium Nitride (GaN) Pillar Structure Light Emitting Diode (LED) Public/Granted day:2015-08-06
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