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公开(公告)号:US11380709B2
公开(公告)日:2022-07-05
申请号:US16558712
申请日:2019-09-03
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Yingda Dong , James Kai , Christopher J. Petti
IPC: H01L21/02 , H01L21/00 , H01L27/11597 , H01L27/1159 , G11C11/22 , H01L29/78 , H01L29/66 , H01L29/51 , H01L29/786
Abstract: A memory element is provided that includes a portion of a bit line plug, a portion of a source line plug, a portion of a word line, a portion of a vertical semiconductor pillar disposed between the bit line plug, the source line plug and adjacent the word line, and a gate oxide including a ferroelectric material disposed between the vertical semiconductor pillar and the word line.
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2.
公开(公告)号:US10541035B1
公开(公告)日:2020-01-21
申请号:US16022373
申请日:2018-06-28
Applicant: SanDisk Technologies LLC
Inventor: Ching-Huang Lu , Han-Ping Chen , Chung-Yao Pai , Yingda Dong
Abstract: Apparatuses and techniques are provided for accurately reading memory cells by compensating for lateral charge diffusion between adjacent memory cells. A selected memory cell is read with a compensation which is based on classifying the threshold voltages of adjacent memory cells into bins. In one aspect, the compensation is based on the level of the current control gate voltage of the selected word line. In another aspect, the classifying of the threshold voltages of the adjacent memory cells can be a function of temperature. In another aspect, a memory cell can be read with compensation after a previous read operation without compensation results in an uncorrectable error. In another aspect, the classifying uses more bins for a selected edge word line.
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公开(公告)号:US10453861B1
公开(公告)日:2019-10-22
申请号:US15938536
申请日:2018-03-28
Applicant: SanDisk Technologies LLC
Inventor: Yingda Dong , Yangyin Chen , Yukihiro Sakotsubo
IPC: H01L27/1159 , H01L27/11597 , H01L27/11524 , H01L27/11556 , H01L27/11582 , H01L27/11519 , H01L27/11565 , H01L27/1157 , H01L27/11587
Abstract: A non-volatile storage element including a control gate, a tunneling layer, a charge storage region, and a blocking layer including a ferroelectric material. The tunneling layer is disposed between the control gate and the charge storage region, and the charge storage region is disposed between the tunneling layer and the blocking layer.
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公开(公告)号:US10446244B1
公开(公告)日:2019-10-15
申请号:US15948761
申请日:2018-04-09
Applicant: SanDisk Technologies LLC
Inventor: Vinh Diep , Ching-Huang Lu , Zhengyi Zhang , Yingda Dong
Abstract: Apparatuses and techniques are described for programming memory cells with a narrow threshold voltage (Vth) distribution in a memory device. In one approach, the final pass of a multi-pass program operation on a word line WLn includes applying a variable voltage to WLn+1 during verify tests on WLn. The variable voltage (Vread) can be an increasing function of the verify voltage on WLn, and thus a function of the data state for which the verify test is performed. In one approach, Vread on WLn+1 is stepped up with each increase in the verify voltage on WLn. The step size in Vread can be the same as, or different than, the step size in the verify voltage. Vread can be different for each different verify voltage, or multiple verify voltages can be grouped for use with a common Vread.
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公开(公告)号:US10438671B1
公开(公告)日:2019-10-08
申请号:US16015612
申请日:2018-06-22
Applicant: SanDisk Technologies LLC
Inventor: Hong-Yan Chen , Yingda Dong
Abstract: Techniques for reducing program disturb of memory cells which are formed in a two-tier stack, when a selected word line is in the upper tier. In one approach, at the start of the program phase of a program loop, voltages of word lines adjacent to the interface are increased to a pass voltage before voltages of remaining word lines are increased to a pass voltage. This delay provides time for residue electrons in the lower tier to move toward the drain end of a NAND string to reduce the likelihood of program disturb. In another approach, the voltages of the word lines adjacent to the interface are maintained at 0 V or other turn-off voltage during the program phase to block the passage of residue electrons from the lower tier to the upper tier.
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公开(公告)号:US20190304986A1
公开(公告)日:2019-10-03
申请号:US15938536
申请日:2018-03-28
Applicant: SanDisk Technologies LLC
Inventor: Yingda Dong , Yangyin Chen , Yukihiro Sakotsubo
IPC: H01L27/1159 , H01L27/11597 , H01L27/11524 , H01L27/11556
Abstract: A non-volatile storage element including a control gate, a tunneling layer, a charge storage region, and a blocking layer including a ferroelectric material. The tunneling layer is disposed between the control gate and the charge storage region, and the charge storage region is disposed between the tunneling layer and the blocking layer.
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公开(公告)号:US10431313B2
公开(公告)日:2019-10-01
申请号:US15923064
申请日:2018-03-16
Applicant: SanDisk Technologies LLC
Inventor: Zhengyi Zhang , Yingda Dong , James Kai , Johann Alsmeier
Abstract: A three-dimensional stacked memory device is configured to provide uniform programming speeds of different sets of memory strings formed in memory holes. In a process for removing sacrificial material from word line layers, a block oxide layer in the memory holes is etched away relatively more when the memory hole is relatively closer to an edge of the word line layers where an etchant is introduced. A thinner block oxide layer is associated with a faster programming speed. To compensate, memory strings at the edges of the word line layers are programmed together, separate from the programming of interior memory strings. A program operation can use a higher initial program voltage for programming the interior memory strings compared to the edge memory strings.
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公开(公告)号:US20190221575A1
公开(公告)日:2019-07-18
申请号:US15971525
申请日:2018-05-04
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Yingda Dong , Yangyin Chen , James Kai
IPC: H01L27/11582 , H01L27/11573 , H01L27/06 , H01L29/20 , G11C16/04 , H01L21/02
Abstract: A three-dimensional memory device includes alternating stacks of insulating strips and electrically conductive strips laterally spaced apart among one another by line trenches and a two-dimensional array of memory stack structures and a two-dimensional array of dielectric pillar structures located in the line trenches. Each line trench is filled with laterally alternating sequence of memory stack structures and dielectric pillar structures. Each memory stack structure contains a vertical semiconductor channel, a pair of blocking dielectrics contacting outer sidewalls of the vertical semiconductor channel, a pair of charge storage layers contacting outer sidewalls of the pair of blocking dielectrics, and a pair of tunneling dielectrics contacting outer sidewalls of the pair of charge storage layers.
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公开(公告)号:US10297329B2
公开(公告)日:2019-05-21
申请号:US15352390
申请日:2016-11-15
Applicant: SanDisk Technologies LLC
Inventor: Peter Rabkin , Yingda Dong , Masaaki Higashitani
Abstract: Methods for improving channel boosting and reducing program disturb during programming of memory cells within a memory array are described. The memory array may comprise a NAND flash memory structure, such as a vertical NAND structure or a bit cost scalable (BiCS) NAND structure. In some cases, by applying continuous voltage ramping to unselected word lines during or throughout a programming operation, the boosting of channels associated with program inhibited memory cells may be improved. In one example, the slope and timing of a Vpass waveform applied to a group of unselected word lines (e.g., the neighboring word lines of the selected word line) during the programming operation may be set based on the location of the selected word line within the memory array and the locations of the group of unselected word lines within the memory array.
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10.
公开(公告)号:US20190074062A1
公开(公告)日:2019-03-07
申请号:US15694008
申请日:2017-09-01
Applicant: SanDisk Technologies LLC
Inventor: Hong-Yan Chen , Wei Zhao , Ching-Huang Lu , Yingda Dong
Abstract: A memory device and associated techniques for reducing read disturb of memory cells during a sensing process. Select gate transistors are transitioned to a conductive state one or more time during a sensing process, at the drain and/or source ends of the memory strings in an unselected sub-block. The transitioning can occur periodically, multiple times during the sensing process. When the select gate transistors are in a conductive state, accumulated holes in the channel can be removed. This help provide a faster decrease of the channel potential when the unselected word line voltages are ramped down at the end of the sensing process. The duration of a disturb-inducing channel gradient which is created next to the edge data memory cell is reduced so that read disturb of this cell is also reduced.
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