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公开(公告)号：US09597359B2
公开(公告)日：2017-03-21
申请号：US13877262
申请日：2011-10-03
Applicant: Jeremy J. Mao , Mo Chen
Inventor： Jeremy J. Mao , Mo Chen
IPC: A61K35/32 , C12N5/077 , C12N5/0775 , C12N5/071 , A61K35/28 , A61K35/36 , A61K35/51 , A61K35/545 , A23L33/10
CPC classification number: A61K35/32 , A23L33/10 , A23V2002/00 , A61K35/28 , A61K35/36 , A61K35/51 , A61K35/545 , C12N5/0654 , C12N5/0664 , C12N5/0697 , C12N2500/38 , C12N2501/39 , C12N2501/415 , C12N2501/998 , C12N2502/13 , C12N2502/1311 , C12N2502/1364 , C12N2533/18 , A23V2200/312
Abstract: Described is a method of forming a mineralized material by co-culturing epithelial cell, such as ameloblast, and mesenchymal cell, such as osteoblast or odontoblast, in a mineral-stimulating medium. Also described is a matrix seeded with epithelial cells and mesenchymal cells and infused with a mineral-stimulating medium capable of forming a mineralized material in the matrix. Methods of manufacturing such compositions and methods of treating mineralization-related conditions are also described.
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2.发明授权Inhibitory RNAs to RNA binding proteins hnRNPA1, hnRNPA2 and PTB and uses thereof 有权RNA结合蛋白hnRNPA1，hnRNPA2和PTB的抑制RNA及其用途公开(公告)号：US09206426B2
公开(公告)日：2015-12-08
申请号：US13582921
申请日：2011-03-07
Applicant: James L. Manley , Mo Chen , Charles David , Jian Zhang
Inventor： James L. Manley , Mo Chen , Charles David , Jian Zhang
IPC: A61K31/70 , C07H21/02 , C07H21/04 , C12N15/113 , A61K31/7105 , A61K31/713 , C12Q1/68
CPC classification number: C12N15/1137 , A61K31/7105 , A61K31/713 , C12N15/113 , C12N2310/14 , C12N2310/531 , C12N2320/31
Abstract: Provided herein are methods to reduce or slow down cell growth, for example in a cancer cell comprising contacting a cell with an effective amount of a combination of inhibitory RNA molecules targeting hnRNPA1, hnRNPA2 and PTB. Provided are methods to identify agents which reduce the levels of hnRNPA1, hnRNPA2 or PTB. Provided are methods to identify agents which increase ratio of PKM1/PKM2 proteins, or reduce PKM2 levels, or increase PKM1 levels.
Abstract translation: 本文提供了减少或减慢细胞生长的方法，例如在癌细胞中，包括使细胞与有效量的靶向hnRNPA1，hnRNPA2和PTB的抑制性RNA分子的组合接触。 提供了鉴定降低hnRNPA1，hnRNPA2或PTB水平的药物的方法。 提供了鉴定增加PKM1 / PKM2蛋白比例或降低PKM2水平或增加PKM1水平的试剂的方法。
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公开(公告)号：US09120265B2
公开(公告)日：2015-09-01
申请号：US13687364
申请日：2012-11-28
Applicant: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen
Inventor： Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen
CPC classification number: B29C59/026 , B82Y10/00 , B82Y40/00 , C08G59/245 , C08L63/00 , G03F7/0002 , Y10T428/31544 , Y10T428/31855
Abstract: A nanoimprint lithography method includes the following steps. First, a first sacrifice layer, a second sacrifice layer and a nanoimprint resist are formed on a substrate. The nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether; a methylmethacrylate, and a diluent solvent. Second, a master stamp with a first nanopattern formed by a number of projecting portions and gaps is provided, and the first nanopattern is pressed into the nanoimprint resist to form a second nanopattern in the nanoimprint resist. Third, the second nanopattern is transferred to the substrate.
Abstract translation: 纳米压印光刻方法包括以下步骤。 首先，在基板上形成第一牺牲层，第二牺牲层和纳米压印抗蚀剂。 纳米压印抗蚀剂包括超支化聚氨酯低聚物，全氟聚醚; 甲基丙烯酸甲酯和稀释剂溶剂。 其次，提供由多个突出部分和间隙形成的具有第一纳米图案的主印模，并且将第一纳米图案压入纳米压印抗蚀剂中以在纳米压印抗蚀剂中形成第二纳米图案。 第三，将第二纳米图案转移到基底。
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公开(公告)号：US08821743B2
公开(公告)日：2014-09-02
申请号：US13658043
申请日：2012-10-23
Applicant: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
Inventor： Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
IPC: C03C15/00
CPC classification number: C03C15/00 , G02B5/1809 , G02B5/1857
Abstract: The disclosure relates to a method for making a grating. The method includes the following steps. First, a substrate is provided. Second, a patterned mask layer is formed on a surface of the substrate. Third, the substrate with the patterned mask layer is placed in a microwave plasma system. Fourth, a plurality of etching gases are guided into the microwave plasma system simultaneously to etch the substrate through three stages. The etching gas includes carbon tetrafluoride (CF4), argon (Ar2), and sulfur hexafluoride (SF6). Finally, the patterned mask layer is removed.
Abstract translation: 本公开涉及一种制造光栅的方法。 该方法包括以下步骤。 首先，提供基板。 其次，在基板的表面上形成有图案的掩模层。 第三，将具有图案化掩模层的衬底放置在微波等离子体系中。 第四，多个蚀刻气体同时被引导到微波等离子体系中，以通过三个阶段蚀刻衬底。 蚀刻气体包括四氟化碳（CF 4），氩（Ar 2）和六氟化硫（SF 6）。 最后，去除图案化的掩模层。
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公开(公告)号：US08170271B2
公开(公告)日：2012-05-01
申请号：US12145619
申请日：2008-06-25
Applicant: Mo Chen
Inventor： Mo Chen
IPC: G06K9/00
CPC classification number: G06K9/3233 , B01L3/5453 , G01N35/00732 , G01N2035/00752 , G06F19/00 , G06T7/0008 , G06T2207/30108
Abstract: A system for identifying test tube types and properties in a sample handling machine using visual information automatically obtained by an optical imager and then processed using vision processing methods. The system includes an optical imager positioned to capture images containing one or more test tubes in a rack and a microcontroller programmed to extract predetermined regions of interest and interpret the optical information in the image to decipher the dimension of the test tubes, determine the presence or absence of caps on the test tubes, decode any encoded data, and interpret custom symbologies. The system may then determine the nature of the test tubes or other containers presented before the image and provide that information to the sample handling machine to assist with processing of samples.
Abstract translation: 一种用于使用由光学成像仪自动获得的视觉信息，然后使用视觉处理方法进行处理的用于识别样品处理机中的试管类型和性质的系统。 该系统包括光学成像器，其被定位成捕获在机架中包含一个或多个试管的图像，以及被编程为提取感兴趣的预定区域并且解释图像中的光学信息以解密试管的尺寸的微控制器， 试管上没有盖子，解码任何编码数据，并解释定制符号。 然后，系统可以确定在图像之前呈现的试管或其他容器的性质，并将该信息提供给样品处理机器以协助处理样品。
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Patent Agency Ranking
公开(公告)号：US08162219B2
公开(公告)日：2012-04-24
申请号：US11971294
申请日：2008-01-09
Applicant: Jeffrey A. Pine , Mo Chen
Inventor： Jeffrey A. Pine , Mo Chen
IPC: G06K7/10
CPC classification number: G06K9/00 , A61B90/90 , A61B90/98 , G06K2209/25
Abstract: A system for automatically identifying a logo or trademark applied to a device and verifying that the logo or trademark is acceptably identifies a compatible device. The system uses an optical imager to capture optical images of the target device and a microcontroller interconnected to the imager for processing the optical image to extract image information and verify that the contents of the image reflect the appropriate manufacturer or supplied indicia required by a host device. The decision reached by the microcontroller may be provided externally to a host device, thereby precluding or allowing use of the device, or provided directly to a user via know means, such as a visual display or audible output.
Abstract translation: 用于自动识别应用于设备的徽标或商标并验证徽标或商标是否可接受地识别兼容设备的系统。 该系统使用光学成像器来捕获目标设备的光学图像和与成像器互连的微控制器，用于处理光学图像以提取图像信息并验证图像的内容反映主机设备所需的适当制造商或提供的标记 。 微控制器达成的决定可以在主机设备外部提供，从而排除或允许使用该设备，或者通过诸如视觉显示或可听输出之类的知识手段直接提供给用户。
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公开(公告)号：US20080136820A1
公开(公告)日：2008-06-12
申请号：US11897224
申请日：2007-08-29
Applicant: Qiong Yang , Chao Wang , Mo Chen , Xiaoou Tang , Zhongfu Ye
Inventor： Qiong Yang , Chao Wang , Mo Chen , Xiaoou Tang , Zhongfu Ye
CPC classification number: G06F3/04845 , G06T7/11 , G06T7/162 , G06T7/194 , G06T11/60 , G06T2200/24 , G06T2207/20092
Abstract: Progressive cut interactive object segmentation is described. In one implementation, a system analyzes strokes input by the user during iterative image segmentation in order to model the user's intention for refining segmentation. In the user intention model, the color of each stroke indicates the user's expectation of pixel label change to foreground or background, the location of the stroke indicates the user's region of interest, and the position of the stroke relative to a previous segmentation boundary indicates a segmentation error that the user intends to refine. Overexpansion of pixel label change is controlled by penalizing change outside the user's region of interest while overshrinkage is controlled by modeling the image as an eroded graph. In each iteration, energy consisting of a color term, a contrast term, and a user intention term is minimized to obtain a segmentation map.
Abstract translation: 描述了渐进切割交互式对象分割。 在一个实现中，系统分析用户在迭代图像分割期间输入的笔画，以便模拟用户的细化细分意图。 在用户意图模型中，每个笔画的颜色表示用户对于前景或背景的像素标签变化的期望，笔画的位置指示用户感兴趣的区域，并且笔画相对于先前分割边界的位置指示 用户打算细化的分段错误。 像素标签变化的过度扩展是通过对用户感兴趣区域之外的变化进行惩罚来控制的，而通过将图像建模为受侵蚀图来控制超损耗。 在每次迭代中，将由颜色项，对比度项和用户意图项组成的能量最小化以获得分割图。
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公开(公告)号：US08976257B2
公开(公告)日：2015-03-10
申请号：US13562894
申请日：2012-07-31
CPC classification number: H04N17/002 , H04N5/235
Abstract: An automatic process for calibrating the optical image exposure value to compensate for changes in machine vision systems to maintain optimal exposure of captured images and adjust for the different characteristics among cameras components, such as imaging sensor sensitivity, LED strength, external lighting, reflective functions of any background material, different external lighting conditions, possible changes or updates of the systems over the years, such as LED changes, and even the aging of camera sensor and LEDs over time. A series of images of a target are captured with a predetermined sequence of exposure values, the saturation exposure percentage of a region of interest is calculated in each of the images, and the saturation exposure percentages are compared to determine the exposure value that has a saturation exposure percentage that varies the least from the saturation exposure value of the preceding and following exposure values.
Abstract translation: 用于校准光学图像曝光值的自动处理，以补偿机器视觉系统的变化，以保持拍摄图像的最佳曝光，并调整摄像机组件之间的不同特性，如成像传感器灵敏度，LED强度，外部照明，反射功能 任何背景材料，不同的外部照明条件，多年来系统的可能变化或更新，例如LED变化，甚至相机传感器和LED随时间的老化。 以预定的曝光值序列拍摄目标的一系列图像，在每个图像中计算感兴趣区域的饱和曝光百分比，并且比较饱和曝光百分比以确定具有饱和度的曝光值 曝光百分比与前一曝光值和后续曝光值的饱和曝光值之间的最小值变化最小。
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公开(公告)号：US08778709B2
公开(公告)日：2014-07-15
申请号：US13479229
申请日：2012-05-23
Applicant: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
Inventor： Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen , Shou-Shan Fan
CPC classification number: H01L33/0079 , H01L33/0066 , H01L33/06 , H01L33/22 , H01L33/24
Abstract: A method for making light emitting diode includes following steps. A substrate is provided. A first semiconductor layer is grown on a surface of the substrate. A patterned mask layer is located on a surface of the first semiconductor layer, and the patterned mask layer includes a number of bar-shaped protruding structures, a slot is defined between each two adjacent protruding structures to expose a portion of the first semiconductor layer. The exposed first semiconductor layer is etched to form a protruding pair. A number of three-dimensional nano-structures are formed by removing the patterned mask layer. An active layer and a second semiconductor layers are grown on the number of three-dimensional nano-structures in that order. A first electrode is electrically connected with the first semiconductor layer. A second electrode is located to cover the entire surface of the second semiconductor layer which is away from the active layer.
Abstract translation: 制造发光二极管的方法包括以下步骤。 提供基板。 在衬底的表面上生长第一半导体层。 图案化的掩模层位于第一半导体层的表面上，并且图案化掩模层包括多个棒状突出结构，在每个两个相邻的突出结构之间限定狭缝以暴露第一半导体层的一部分。 暴露的第一半导体层被蚀刻以形成突出的一对。 通过去除图案化掩模层形成多个三维纳米结构。 在三维纳米结构的数量上依次生长有源层和第二半导体层。 第一电极与第一半导体层电连接。 第二电极被定位成覆盖远离有源层的第二半导体层的整个表面。
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公开(公告)号：US08574822B2
公开(公告)日：2013-11-05
申请号：US13479484
申请日：2012-05-24
Applicant: Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen
Inventor： Zhen-Dong Zhu , Qun-Qing Li , Li-Hui Zhang , Mo Chen
CPC classification number: B29C59/026 , B82Y10/00 , B82Y40/00 , C08G59/245 , C08L63/00 , G03F7/0002 , Y10T428/31544 , Y10T428/31855
Abstract: A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
Abstract translation: 纳米压印抗蚀剂包括超支化聚氨酯低聚物，全氟聚醚，甲基丙烯酸甲酯，稀释剂溶剂和光引发剂。 超支化聚氨酯低聚物可以通过偏苯三酸酐，乙烯硫醇和环氧丙烯酸的共聚来聚合。 超支化聚氨酯低聚物也可以通过开环共聚环氧丙烯酸和乙二醇聚合。
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