Feedback control by RF waveform tailoring for ion energy distribution

    公开(公告)号:US10395895B2

    公开(公告)日:2019-08-27

    申请号:US14837512

    申请日:2015-08-27

    Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

    Apparatus and tuning method for mitigating RF load impedance variations due to periodic disturbances

    公开(公告)号:US12183549B2

    公开(公告)日:2024-12-31

    申请号:US17979129

    申请日:2022-11-02

    Abstract: A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

    Feedback control by RF waveform tailoring for ion energy distribution

    公开(公告)号:US10692698B2

    公开(公告)日:2020-06-23

    申请号:US16509088

    申请日:2019-07-11

    Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

    Supervisory control of radio frequency (RF) impedance tuning operation

    公开(公告)号:US10666206B2

    公开(公告)日:2020-05-26

    申请号:US15846922

    申请日:2017-12-19

    Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.

    Pulsed, bidirectional radio frequency source/load

    公开(公告)号:US10930470B2

    公开(公告)日:2021-02-23

    申请号:US16710412

    申请日:2019-12-11

    Abstract: A radio frequency power system includes a master RF generator and an auxiliary RF generator, wherein each generator outputs a respective RF signal. The master RF generator also outputs a RF control signal to the auxiliary RF generator, and the RF signal output by the auxiliary RF generator varies in accordance with the RF control signal. The auxiliary RF generator receives sense signals indicative of an electrical characteristic of the respective RF signals output by the master RF generator and the auxiliary RF generator. The auxiliary RF generator determines a phase difference between the RF signals. The sensed electrical characteristics and the phase are used independently or cooperatively to control the phase and amplitude of the RF signal output by the auxiliary RF generator. The auxiliary generator includes an inductive clamp circuit that returns energy reflected energy back from a coupling network to a variable resistive load.

    Pulsed, bidirectional radio frequency source/load

    公开(公告)号:US10546724B2

    公开(公告)日:2020-01-28

    申请号:US15974947

    申请日:2018-05-09

    Abstract: A radio frequency power system includes a master RF generator and an auxiliary RF generator, wherein each generator outputs a respective RF signal. The master RF generator also outputs a RF control signal to the auxiliary RF generator, and the RF signal output by the auxiliary RF generator varies in accordance with the RF control signal. The auxiliary RF generator receives sense signals indicative of an electrical characteristic of the respective RF signals output by the master RF generator and the auxiliary RF generator. The auxiliary RF generator determines a phase difference between the RF signals. The sensed electrical characteristics and the phase are used independently or cooperatively to control the phase and amplitude of the RF signal output by the auxiliary RF generator. The auxiliary generator includes an inductive clamp circuit that returns energy reflected energy back from a coupling network to a variable resistive load.

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