公开(公告)号：US20220020610A1

公开(公告)日：2022-01-20

申请号：US17489277

申请日：2021-09-29

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Mitsuhiko Inaba

IPC: H01L21/67 ,  B08B1/04 ,  B08B1/00 ,  B24B37/04 ,  H01L21/02 ,  B24B37/34

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

公开(公告)号：US12020976B2

公开(公告)日：2024-06-25

申请号：US17212842

申请日：2021-03-25

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Koji Maeda ,  Mitsuhiko Inaba

IPC: H01L21/687 ,  B08B3/08 ,  B24B41/06 ,  H01L21/00 ,  H01L21/30 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/68742 ,  B08B3/08 ,  B24B41/06 ,  H01L21/00 ,  H01L21/30 ,  H01L21/67051 ,  H01L21/6838 ,  H01L21/68735

Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

公开(公告)号：US11164757B2

公开(公告)日：2021-11-02

申请号：US16503868

申请日：2019-07-05

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Mitsuhiko Inaba

IPC: H01L21/67 ,  B08B1/00 ,  B08B1/04 ,  B24B37/04 ,  H01L21/02 ,  B24B37/34

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

公开(公告)号：US12002688B2

公开(公告)日：2024-06-04

申请号：US18328626

申请日：2023-06-02

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Mitsuhiko Inaba

IPC: H01L21/67 ,  B08B1/14 ,  B08B1/32 ,  B24B37/04 ,  B24B37/34 ,  H01L21/02

CPC classification number: H01L21/67046 ,  B08B1/143 ,  B08B1/145 ,  B08B1/32 ,  B24B37/04 ,  B24B37/34 ,  H01L21/02096 ,  H01L21/67219

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

公开(公告)号：US20210210374A1

公开(公告)日：2021-07-08

申请号：US17212842

申请日：2021-03-25

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Koji Maeda ,  Mitsuhiko Inaba

IPC: H01L21/687 ,  H01L21/67 ,  B08B3/08 ,  B24B41/06 ,  H01L21/683 ,  H01L21/00 ,  H01L21/30

Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.

公开(公告)号：US20210175099A1

公开(公告)日：2021-06-10

申请号：US16612194

申请日：2018-05-02

Applicant: EBARA CORPORATION

Inventor： Hidetatsu Isokawa ,  Mitsuhiko Inaba ,  Haiyang Xu

IPC: H01L21/67 ,  B08B1/00 ,  B08B1/04 ,  B08B13/00

Abstract: A cleaning device is described. In one embodiment, the cleaning device includes a cleaning member; a moving portion, a measurement portion, and a controller. The controller performs a reset operation in which the cleaning member is pressed against the reference member before cleaning, a cleaning member is moved in a direction away from the reference member after the measured value of the measurement portion reaches a predetermined reset load, when the measurement values of the measurement portion for each unit movement amount of the cleaning member become equal to each other at least twice consecutively, a position of the cleaning member at the time is set as a reference position of the cleaning member at the time of cleaning, and the measurement value of the measurement portion at the time is set as a pressing reference value at the time of cleaning.

公开(公告)号：US12042901B2

公开(公告)日：2024-07-23

申请号：US17740190

申请日：2022-05-09

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Fujihiko Toyomasu

IPC: B24B37/34 ,  B08B3/08 ,  G01F1/66 ,  H01L21/67 ,  B08B3/00 ,  G01F1/36 ,  H01L21/306

CPC classification number: B24B37/34 ,  B08B3/08 ,  G01F1/66 ,  H01L21/6704 ,  B08B3/00 ,  G01F1/36 ,  H01L21/30625

Abstract: A cleaning liquid supply device for supplying a cleaning device with cleaning liquid includes a chemical liquid inlet portion and a dilution water inlet portion, a first chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion, and a second chemical liquid control unit fluidically connected to the chemical liquid inlet portion and the dilution water inlet portion. The first chemical liquid control unit includes a first chemical-liquid-flow-rate control unit, a first dilution-water-flow-rate control unit, and a first mixing portion. The second chemical liquid control unit includes a second chemical-liquid-flow-rate control unit, a second dilution-water-flow-rate control unit, and a second mixing portion.

公开(公告)号：US11996303B2

公开(公告)日：2024-05-28

申请号：US18328645

申请日：2023-06-02

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Mitsuhiko Inaba

IPC: H01L21/67 ,  B08B1/14 ,  B08B1/32 ,  B24B37/04 ,  B24B37/34 ,  H01L21/02

CPC classification number: H01L21/67046 ,  B08B1/143 ,  B08B1/145 ,  B08B1/32 ,  B24B37/04 ,  B24B37/34 ,  H01L21/02096 ,  H01L21/67219

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

公开(公告)号：US11869788B2

公开(公告)日：2024-01-09

申请号：US16636960

申请日：2018-08-09

Applicant: EBARA CORPORATION

Inventor： Koji Maeda ,  Mitsuhiko Inaba ,  Haiyang Xu ,  Tetsuya Yashima

IPC: H01L21/67 ,  H01L21/677 ,  B24B37/00 ,  H01L21/304 ,  B08B15/00 ,  B24B37/34

CPC classification number: H01L21/677 ,  B08B15/005 ,  B24B37/00 ,  B24B37/345 ,  H01L21/304

Abstract: A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.

公开(公告)号：US20230307259A1

公开(公告)日：2023-09-28

申请号：US18328626

申请日：2023-06-02

Applicant: EBARA CORPORATION

Inventor： Haiyang Xu ,  Mitsuhiko Inaba

IPC: H01L21/67 ,  B08B1/04 ,  B08B1/00 ,  B24B37/04 ,  H01L21/02 ,  B24B37/34

CPC classification number: H01L21/67046 ,  B08B1/04 ,  B08B1/006 ,  B24B37/04 ,  H01L21/02096 ,  H01L21/67219 ,  B24B37/34 ,  B08B1/003

Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.