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公开(公告)号：US20200077195A1
公开(公告)日：2020-03-05
申请号：US16544646
申请日：2019-08-19
Applicant: FU JEN CATHOLIC UNIVERSITY , MICRO LITHOGRAPHY INC.
Inventor： Ching-Bore WANG , Chien-Sheng CHEN , Hao-Zhi LI , Wei-Jen LEE
Abstract: A speaker diaphragm structure is installed inside a sound generator device which comprises a frame, a speaker diaphragm structure installed within the frame and a suspension edge whose inner perimeter is connected to the speaker diaphragm structure and whose outer perimeter is connected to the frame; herein the speaker diaphragm structure includes a diaphragm body and a composite material layer, in which the composite material layer is used for bonding onto the surface of the diaphragm body or attaching within the diaphragm body; moreover, the composite material layer is composed of one or more types of tetrapyrrole compounds as well as one or more types of metal ions; additionally, the composite material layer has a thickness smaller than the thickness of the diaphragm body, and is mainly applied to provide the performance effect of sound quality modifications.
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公开(公告)号：US20020181092A1
公开(公告)日：2002-12-05
申请号：US09870730
申请日：2001-05-30
Applicant: Micro Lithography, Inc.
Inventor： Ching-Bore Wang
IPC: F21V009/06 , G02B005/20 , F21V009/04 , G02B001/00 , G02B005/08
CPC classification number: G03F1/62
Abstract: An antistatic pellicle for use with deep-ultraviolet light. The pellicle is coated with a thin metal oxide layer that has high transmissivity for deep-ultraviolet light and an electrical resistivity low enough to minimize electrostatic discharge. The metal oxide layer may be produced by a sol-gel process using a reactive polyvalent metal sol-precursor. The sol-precursor is converted to a sol, the sol is applied to a membrane so that it produces a gel on a surface of the membrane, and then the gel is dried to a coating.
Abstract translation: 用于深紫外线的抗静电防护薄膜。 该防护薄膜组件涂覆有对于深紫外光具有高透射率的薄金属氧化物层，并且具有足够低的电阻以最小化静电放电。 金属氧化物层可以通过使用反应性多价金属溶胶 - 前体的溶胶 - 凝胶法制备。 将溶胶前体转化成溶胶，将溶胶施加到膜上，使其在膜的表面上产生凝胶，然后将凝胶干燥成涂层。
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公开(公告)号：US08968971B2
公开(公告)日：2015-03-03
申请号：US13789894
申请日：2013-03-08
Applicant: Micro Lithography, Inc.
Inventor： Ching-Bore Wang
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
Abstract translation: 描述光刻制造中使用的光掩模用薄膜。 防护薄膜组件的框架可以包括形成在侧构件中的凹部和锁定构件，所述锁定构件的尺寸被设计成当膜设置在凹部和锁定构件之间时将膜固定到框架。 防护薄膜组件可以使用与光掩模的侧表面接触的非粘性附着构件固定到光掩模。
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Patent Agency Ranking
公开(公告)号：US20040043302A1
公开(公告)日：2004-03-04
申请号：US10229437
申请日：2002-08-27
Applicant: Micro Lithography, Inc.
Inventor： Ching-Bore Wang
IPC: G03F009/00
CPC classification number: G03F1/64
Abstract: The present invention provides an optical pellicle system which includes a frame having a top side and bottom side, a pellicle membrane configured to cover the top side of the frame, a photomask to which the bottom side of the frame is mounted, and at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame.
Abstract translation: 本发明提供一种光学防护薄膜系统，其包括具有顶侧和底侧的框架，被配置为覆盖框架的顶侧的防护薄膜组件，安装框架的底侧的光掩模和至少一个 限定在光掩模中的通气槽，在框架下方从框架内限定的区域延伸到框架外部的区域。
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公开(公告)号：US20030020894A1
公开(公告)日：2003-01-30
申请号：US09916737
申请日：2001-07-26
Applicant: Micro Lithography, Inc.
Inventor： Ching-Bore Wang
IPC: G03B027/62
CPC classification number: G03F1/64 , G03F1/62 , G03F7/70983
Abstract: Optical pellicles for photomasks are described, where the optical pellicle is configured to be reversibly affixed to the photomask with a non-adhesive mounting member, such as a vacuum system or an electrostatic film. The optical pellicles of the invention are readily removed from the photomask and reattached without the use of adhesives, and are well-suited for use by automated methods.
Abstract translation: 描述了用于光掩模的光学薄膜，其中光学防护薄膜被配置为可逆地固定到光掩模上的非粘性安装构件，例如真空系统或静电膜。 本发明的光学薄膜易于从光掩模中去除并重新附着而不使用粘合剂，并且非常适合于通过自动化方法使用。
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公开(公告)号：US20030022073A1
公开(公告)日：2003-01-30
申请号：US09916732
申请日：2001-07-26
Applicant: Micro Lithography, Inc.
Inventor： Ching-Bore Wang
IPC: B32B017/06 , G03F009/00 , G03G016/00 , G03C005/00 , B32B009/00
CPC classification number: G03F1/48
Abstract: Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.
Abstract translation: 描述了用于光刻工艺的光掩模，其在其表面上并入保护性无定形聚（碳氟化合物）膜，该膜用于减少光掩模表面处的污染。 还描述了涂覆的光掩模的制备，以及它们在光刻工艺中的用途。
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公开(公告)号：US10771900B2
公开(公告)日：2020-09-08
申请号：US16544646
申请日：2019-08-19
Applicant: FU JEN CATHOLIC UNIVERSITY , MICRO LITHOGRAPHY INC.
Inventor： Ching-Bore Wang , Chien-Sheng Chen , Hao-Zhi Li , Wei-Jen Lee
Abstract: A speaker diaphragm structure is installed inside a sound generator device which comprises a frame, a speaker diaphragm structure installed within the frame and a suspension edge whose inner perimeter is connected to the speaker diaphragm structure and whose outer perimeter is connected to the frame; herein the speaker diaphragm structure includes a diaphragm body and a composite material layer, in which the composite material layer is used for bonding onto the surface of the diaphragm body or attaching within the diaphragm body; moreover, the composite material layer is composed of one or more types of tetrapyrrole compounds as well as one or more types of metal ions; additionally, the composite material layer has a thickness smaller than the thickness of the diaphragm body, and is mainly applied to provide the performance effect of sound quality modifications.
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公开(公告)号：US20140255827A1
公开(公告)日：2014-09-11
申请号：US13789894
申请日：2013-03-08
Applicant: MICRO LITHOGRAPHY, INC.
Inventor： Ching-Bore Wang
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
Abstract translation: 描述光刻制造中使用的光掩模用薄膜。 防护薄膜组件的框架可以包括形成在侧构件中的凹部和锁定构件，所述锁定构件的尺寸被设计成当膜设置在凹部和锁定构件之间时将膜固定到框架。 防护薄膜组件可以使用与光掩模的侧表面接触的非粘性附着构件固定到光掩模。
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