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1.发明授权Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless 有权具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置公开(公告)号：US08368868B2
公开(公告)日：2013-02-05
申请号：US12627087
申请日：2009-11-30
Applicant: Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
Inventor： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC: G03B27/42
CPC classification number: G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
Abstract translation: 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。
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公开(公告)号：US08334983B2
公开(公告)日：2012-12-18
申请号：US12768883
申请日：2010-04-28
Applicant: Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
Inventor： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
IPC: G01B11/02
CPC classification number: G03F7/70775
Abstract: A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
Abstract translation: 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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3.发明申请LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS 有权用于控制连续装置的平面位置的气体压力装置的平面设备公开(公告)号：US20100159399A1
公开(公告)日：2010-06-24
申请号：US12627087
申请日：2009-11-30
Applicant: Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
Inventor： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
CPC classification number: G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
Abstract translation: 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。
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Patent Agency Ranking
公开(公告)号：US20090168042A1
公开(公告)日：2009-07-02
申请号：US12292962
申请日：2008-12-01
Applicant: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
Inventor： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
IPC: G03B27/60
CPC classification number: G03F7/70341
Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.
Abstract translation: 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台，所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘，以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。
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公开(公告)号：US08189174B2
公开(公告)日：2012-05-29
申请号：US12616279
申请日：2009-11-11
Applicant: Matthias Kruizinga , Frank Auer , Fransiscus Mathijs Jacobs , Ronnie Herman Anna Hensen
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70733
Abstract: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.
Abstract translation: 光刻设备包括两个阶段，每个阶段被配置为保持基底，其中每个阶段设置有短行程模块，以移动具有基底的台面和长行程模块以移动该阶段的短冲程模块。 光刻设备包括用于耦合级的交换桥，并且其中，在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级经由 互换桥联合运动。
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公开(公告)号：US20100297561A1
公开(公告)日：2010-11-25
申请号：US12768883
申请日：2010-04-28
Applicant: Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
Inventor： Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
CPC classification number: G03F7/70775
Abstract: A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
Abstract translation: 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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公开(公告)号：US20100128241A1
公开(公告)日：2010-05-27
申请号：US12616279
申请日：2009-11-11
Applicant: Matthias KRUIZINGA , Frank Auer , Fransiscus Mathijs Jacobs , Ronnie Herman Anna Hensen
IPC: G03B27/58
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70733
Abstract: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement.
Abstract translation: 光刻设备包括两个阶段，每个阶段被配置为保持基底，其中每个阶段设置有短行程模块，以移动具有基底的台面和长行程模块以移动该阶段的短冲程模块。 光刻设备包括用于耦合级的交换桥，并且其中，在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级通过 互换桥联合运动。
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公开(公告)号：US20090168037A1
公开(公告)日：2009-07-02
申请号：US12292963
申请日：2008-12-01
Applicant: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
Inventor： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.
Abstract translation: 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。
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