Invention Grant
- Patent Title: Method for manufacturing light emitting diode chip
- Patent Title (中): 制造发光二极管芯片的方法
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Application No.: US13917651Application Date: 2013-06-14
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Publication No.: US09054270B2Publication Date: 2015-06-09
- Inventor: Tzu-Chien Hung , Chia-Hui Shen
- Applicant: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Applicant Address: TW Hsinchu Hsien
- Assignee: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Current Assignee: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Current Assignee Address: TW Hsinchu Hsien
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN201010165942 20100507
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/22 ; H01L33/38 ; H01L33/64 ; H01L33/36 ; H01L21/60

Abstract:
A method for manufacturing a light emitting diode includes providing an epitaxial wafer having a substrate and an epitaxial layer allocated on the substrate. The epitaxial layer comprises a first semiconductor layer, an active layer, a second semiconductor layer sequentially allocated, and at least one blind hole penetrating the second semiconductor layer, the active layer and inside the first semiconductor layer; then a first electrode is formed on the first semiconductor layer inside the at least one blind hole and a second electrode is formed on the second semiconductor layer; thereafter a first supporting layer is allocated on the first electrode and a second supporting layer is allocated on the second electrode.
Public/Granted literature
- US20130280835A1 METHOD FOR MANUFACTURING LIGHT EMITTING DIODE CHIP Public/Granted day:2013-10-24
Information query
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