Invention Grant
US08368868B2 Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless
有权
具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置
- Patent Title: Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless
- Patent Title (中): 具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置
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Application No.: US12627087Application Date: 2009-11-30
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Publication No.: US08368868B2Publication Date: 2013-02-05
- Inventor: Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
- Applicant: Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
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