- Patent Title: Cleaning device, substrate processing apparatus, maintenance method of cleaning device, and computer-readable recording medium including maintenance program of cleaning device
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Application No.: US16612194Application Date: 2018-05-02
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Publication No.: US11380561B2Publication Date: 2022-07-05
- Inventor: Hidetatsu Isokawa , Mitsuhiko Inaba , Haiyang Xu
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JPJP2017-094029 20170510
- International Application: PCT/JP2018/017539 WO 20180502
- International Announcement: WO2018/207704 WO 20181115
- Main IPC: B08B1/00
- IPC: B08B1/00 ; B08B1/04 ; B08B13/00 ; H01L21/67

Abstract:
A cleaning device is described. In one embodiment, the cleaning device includes a cleaning member; a moving portion, a measurement portion, and a controller. The controller performs a reset operation in which the cleaning member is pressed against the reference member before cleaning, a cleaning member is moved in a direction away from the reference member after the measured value of the measurement portion reaches a predetermined reset load, when the measurement values of the measurement portion for each unit movement amount of the cleaning member become equal to each other at least twice consecutively, a position of the cleaning member at the time is set as a reference position of the cleaning member at the time of cleaning, and the measurement value of the measurement portion at the time is set as a pressing reference value at the time of cleaning.
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