Invention Grant
- Patent Title: Overhang model for reducing passivation stress and method for producing the same
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Application No.: US15909684Application Date: 2018-03-01
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Publication No.: US11031358B2Publication Date: 2021-06-08
- Inventor: Aarthi Sridharan , Gong Cheng , Premachandran Chirayarikathuveedu , Fahad Mirza , Carole Graas , Sricharan Tubati , Nurul Islam Mohd
- Applicant: MARVELL INTERNATIONAL LTD.
- Applicant Address: BM Hamilton
- Assignee: MARVELL INTERNATIONAL LTD.
- Current Assignee: MARVELL INTERNATIONAL LTD.
- Current Assignee Address: BM Hamilton
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/31 ; H01L21/768 ; H01L21/02

Abstract:
A method for forming a sensor with increased overhang to prevent passivation stress fractures is provided. Embodiments include forming a first passivation layer over a dielectric layer patterned over a first top metal layer of a logic region of a sensor and a second top metal layer of an array region of the sensor; planarizing the first passivation layer and the dielectric layer to form a level surface above the first top metal layer and the second top metal layer; etching the dielectric layer to form a pad opening in the array region of the sensor based on a predetermined overhang value, the pad opening exposing a portion of the surface of the second top metal layer; and forming a second passivation layer over the level surface and the pad opening in the array region.
Public/Granted literature
- US20190273051A1 OVERHANG MODEL FOR REDUCING PASSIVATION STRESS AND METHOD FOR PRODUCING THE SAME Public/Granted day:2019-09-05
Information query
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