Invention Grant
- Patent Title: Semiconductor wafer having bevel portion
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Application No.: US16035170Application Date: 2018-07-13
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Publication No.: US10553677B2Publication Date: 2020-02-04
- Inventor: Yeon-sook Kim , In-ji Lee , Doek-gil Ko , Woo-seung Jung
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2017-0181523 20171227
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L29/06

Abstract:
A semiconductor wafer is provided. The semiconductor wafer includes a wafer body including a first surface and a second surface opposite the first surface; and a bevel portion disposed along an outer circumference of the wafer body and including an inclined surface, an outermost point, a first surface end portion connecting the bevel portion to the first surface and a second surface end portion connecting the bevel portion to the second surface. A first bevel angle between a first tangential direction of the inclined surface and the first surface corresponds to a capillary force of a fluid on the first surface, and a first bevel length between the first surface end portion and the outermost point along a first direction substantially parallel to the first surface corresponds to a first surface flatness.
Public/Granted literature
- US20190198613A1 SEMICONDUCTOR WAFER HAVING BEVEL PORTION Public/Granted day:2019-06-27
Information query
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