Invention Grant
- Patent Title: Method for producing semiconductor laser element
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Application No.: US15258868Application Date: 2016-09-07
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Publication No.: US09991671B2Publication Date: 2018-06-05
- Inventor: Hiroki Sakata , Hiroki Koizumi
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan-Shi
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan-Shi
- Agency: Foley & Lardner LLP
- Priority: JP2015-179967 20150911
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/33 ; H01L21/82 ; H01S5/02 ; H01S5/042 ; H01S5/30

Abstract:
A method for producing a semiconductor laser element includes providing a semiconductor wafer comprising: a nitride semiconductor substrate, and a semiconductor stack located on the substrate, the semiconductor stack including a plurality of nitride semiconductor layers; forming in the substrate a fissure starting point and a fissure extending from the fissure starting point; forming a cleavage reference portion extending parallel to a cleavage plane of the semiconductor wafer as estimated from a plan view shape of the fissure; and cleaving the semiconductor wafer parallel to the cleavage reference portion to thereby obtain resonator end faces.
Public/Granted literature
- US20170077672A1 METHOD FOR PRODUCING SEMICONDUCTOR LASER ELEMENT Public/Granted day:2017-03-16
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