Invention Grant
- Patent Title: Electrowetting device
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Application No.: US13609744Application Date: 2012-09-11
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Publication No.: US09989752B2Publication Date: 2018-06-05
- Inventor: Kwang-Chul Jung , Seong Gyu Kwon , Mee Hye Jung
- Applicant: Kwang-Chul Jung , Seong Gyu Kwon , Mee Hye Jung
- Applicant Address: US WA Seattle
- Assignee: Amazon Technologies, Inc.
- Current Assignee: Amazon Technologies, Inc.
- Current Assignee Address: US WA Seattle
- Agency: EIP US LLP
- Priority: KR10-2012-0039776 20120417
- Main IPC: G02B26/00
- IPC: G02B26/00 ; G02B3/12

Abstract:
An electrowetting device is provided that includes a lower substrate and an upper substrate facing each other, a first electrode positioned on the lower substrate, an edge electrode positioned on the lower substrate and adjacent to an edge of the first electrode, a hydrophobic insulating layer positioned on the first electrode and the edge electrode, a partition positioned on the lower substrate, a second electrode positioned on the upper substrate, and a first liquid and a second liquid positioned between the upper substrate and the lower substrate, wherein an electric field of a portion where the edge electrode is positioned is smaller than an electric field of a portion where the first electrode is positioned.
Public/Granted literature
- US20130271817A1 ELECTROWETTING DEVICE Public/Granted day:2013-10-17
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