Invention Grant
- Patent Title: Distributed, concentric multi-zone plasma source systems, methods and apparatus
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Application No.: US13627696Application Date: 2012-09-26
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Publication No.: US09967965B2Publication Date: 2018-05-08
- Inventor: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William Entley
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306 ; H05H1/46 ; H01J37/32 ; H05H1/50
Abstract:
A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
Public/Granted literature
- US20130025788A1 Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus Public/Granted day:2013-01-31
Information query
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