- Patent Title: Semiconductor memory device and method for manufacturing the same
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Application No.: US15455725Application Date: 2017-03-10
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Publication No.: US09966386B2Publication Date: 2018-05-08
- Inventor: Hisashi Kato , Hideki Inokuma , Naoki Yamamoto
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-185112 20160923
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/11582 ; H01L21/311 ; H01L27/11556 ; H01L27/11521 ; H01L27/11526 ; H01L27/11568 ; H01L27/11573 ; H01L27/11519 ; H01L27/11565 ; H01L21/28

Abstract:
According to one embodiment, a semiconductor memory device includes first to third conductive layers extending along a first direction, and a memory portion. A portion of the second conductive layer is provided between the third conductive layer and a portion of the first conductive layer. The first conductive layer includes a first end portion crossing the first direction. The second conductive layer includes a second end portion crossing the first direction. The third conductive layer includes a third end portion crossing the first direction. A position in the first direction of a portion of the second end portion is between a position of the first end portion and a position of the third end portion. The position in the first direction of the portion of the second end portion is between a position of another portion of the second end portion and the position of the third end portion.
Public/Granted literature
- US20180090510A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-03-29
Information query
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