Invention Grant
- Patent Title: Methods and apparatus for package with interposers
-
Application No.: US15335260Application Date: 2016-10-26
-
Publication No.: US09966321B2Publication Date: 2018-05-08
- Inventor: Chun-Lin Lu , Kai-Chiang Wu , Yen-Ping Wang , Shih-Wei Liang , Ching-Feng Yang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/24 ; H05K1/18 ; H01L21/48 ; H01L21/56 ; H01L23/498 ; H01L25/10 ; H01L23/00

Abstract:
An interposer may comprise a metal layer above a substrate. A dam or a plurality of dams may be formed above the metal layer. A dam surrounds an area of a size larger than a size of a die which may be connected to a contact pad above the metal layer within the area. A dam may comprise a conductive material, or a non-conductive material, or both. An underfill may be formed under the die, above the metal layer, and contained within the area surrounded by the dam, so that no underfill may overflow outside the area surrounded by the dam. Additional package may be placed above the die connected to the interposer to form a package-on-package structure.
Public/Granted literature
- US20170047261A1 Methods and Apparatus for Package with Interposers Public/Granted day:2017-02-16
Information query
IPC分类: