Invention Grant
- Patent Title: Method and apparatus for detecting crystal orientation of silicon wafer
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Application No.: US15303386Application Date: 2014-05-13
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Publication No.: US09965846B2Publication Date: 2018-05-08
- Inventor: Shaoyong Fu , Zhen Xiong
- Applicant: Trina Solar Co., Ltd
- Applicant Address: CN Changzhou, Jiangsu
- Assignee: Trina Solar Co., Ltd
- Current Assignee: Trina Solar Co., Ltd
- Current Assignee Address: CN Changzhou, Jiangsu
- Agency: Marshall & Melhorn, LLC
- Priority: CN201410146800 20140411
- International Application: PCT/CN2014/077340 WO 20140513
- International Announcement: WO2015/154326 WO 20151015
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/55 ; G01N21/84 ; G06K9/46 ; H04N5/225 ; H01L21/66 ; H01L29/04

Abstract:
A method and apparatus for detecting crystal orientation of a silicon wafer is proposed. The detection method uses a camera shooting device to irradiate the silicon wafer in a rotation manner in different angular directions and obtains the corresponding reflection intensities, based on which a reflection curve is drawn for a grain of interest in a polar coordinate system; normal directions of three or more faces of a regular octahedron of a grain are determined by identifying a pixel brightness extreme value in the reflection curve, and then all normal vectors of the regular octahedron are calculated, so that a crystal orientation of the grain of interest may be calculated. The camera shooting device has a light source and one or more camera shooting probes.
Public/Granted literature
- US20170039696A1 METHOD AND APPARATUS FOR DETECTING CRYSTAL ORIENTATION OF SILICON WAFER Public/Granted day:2017-02-09
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