Invention Grant
- Patent Title: Silicon wafer edge protection device
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Application No.: US15541331Application Date: 2015-12-27
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Publication No.: US09964864B2Publication Date: 2018-05-08
- Inventor: Xu Zhou , Haicang Cui , Fei Ni , Lili Ge
- Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Applicant Address: CN Shanghai
- Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Current Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Current Assignee Address: CN Shanghai
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: CN201410857409 20141230
- International Application: PCT/CN2015/099084 WO 20151227
- International Announcement: WO2016/107507 WO 20160707
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20

Abstract:
A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.
Public/Granted literature
- US20170357162A1 SILICON WAFER EDGE PROTECTION DEVICE Public/Granted day:2017-12-14
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