Invention Grant
- Patent Title: IR assisted fan-out wafer level packaging using silicon handler
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Application No.: US15085099Application Date: 2016-03-30
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Publication No.: US09935009B2Publication Date: 2018-04-03
- Inventor: Bing Dang , Jeffrey D. Gelorme , John U. Knickerbocker
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Louis J. Percello, Esq.
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/00 ; H01L23/31 ; H01L23/29 ; H01L23/48

Abstract:
A support structure for use in fan-out wafer level packaging is provided that includes, a silicon handler wafer having a first surface and a second surface opposite the first surface, a release layer is located above the first surface of the silicon handler wafer, and a layer selected from the group consisting of an adhesive layer and a redistribution layer is located on a surface of the release layer. After building-up a fan-out wafer level package on the support structure, infrared radiation is employed to remove (via laser ablation) the release layer, and thus remove the silicon handler wafer from the fan-out wafer level package.
Public/Granted literature
- US20170287782A1 IR ASSISTED FAN-OUT WAFER LEVEL PACKAGING USING SILICON HANDLER Public/Granted day:2017-10-05
Information query
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