Invention Grant
- Patent Title: Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
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Application No.: US15210115Application Date: 2016-07-14
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Publication No.: US09934944B2Publication Date: 2018-04-03
- Inventor: Masato Akita , Akio Ui , Yasushi Sanada
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2015-141202 20150715
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J9/18 ; A61L9/22 ; H05H1/24

Abstract:
In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.
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