Invention Grant
- Patent Title: Focused ion beam apparatus, method for observing cross-section of sample by using the same, and storage medium
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Application No.: US14224164Application Date: 2014-03-25
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Publication No.: US09934938B2Publication Date: 2018-04-03
- Inventor: Atsushi Uemoto , Xin Man , Tatsuya Asahata
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Klintworth & Rosenblat IP LLP
- Agent Bruce L. Adams
- Priority: JP2013-068169 20130328
- Main IPC: H01J37/04
- IPC: H01J37/04 ; H01J37/28 ; H01J37/22 ; G01N23/225

Abstract:
A focused ion beam apparatus includes a focused ion beam irradiation mechanism that forms first and second cross-sections in a sample. A first image generation unit generates respective first images, either reflected electron images or secondary electron images, of the first and second cross-sections, and a second image generation unit generates a second image that is an EDS image of the first cross-section. A control section generates a three-dimensional image of a specific composition present in the sample based on the first images and the second image.
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