Invention Grant
- Patent Title: Multi charged particle beam writing apparatus and multi charged particle beam writing method
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Application No.: US15225969Application Date: 2016-08-02
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Publication No.: US09934935B2Publication Date: 2018-04-03
- Inventor: Ryoichi Yoshikawa , Hideo Inoue , Hayato Kimura , Yasuo Kato , Jun Yashima
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-158747 20150811
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/24 ; H01J37/317

Abstract:
A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.
Public/Granted literature
- US20170047194A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2017-02-16
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