Invention Grant
- Patent Title: Source mask optimization to reduce stochastic effects
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Application No.: US14968561Application Date: 2015-12-14
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Publication No.: US09934346B2Publication Date: 2018-04-03
- Inventor: Steven George Hansen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20 ; G03F1/70
Abstract:
Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.
Public/Granted literature
- US20160110488A1 SOURCE MASK OPTIMIZATION TO REDUCE STOCHASTIC EFFECTS Public/Granted day:2016-04-21
Information query
