Invention Grant
- Patent Title: Microlithography illumination optical system and microlithography projection exposure apparatus including same
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Application No.: US13681938Application Date: 2012-11-20
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Publication No.: US09933704B2Publication Date: 2018-04-03
- Inventor: Michael Patra , Markus Deguenther , Michael Layh
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102010030089 20100615
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A microlithography illumination optical system is used to guide illumination light from a primary light source to an object field. A mirror array of the illumination optical system has a plurality of individual mirrors, which can be tilted independently of one another by actuators and are connected to associated tilting actuators. A controller is used to activate the actuators. A raster module of the illumination optical system has a plurality of raster elements to produce a spatially distributed arrangement of secondary light sources.
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