Invention Grant
- Patent Title: Physical vapor deposition system using backside gas cooling of workpieces
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Application No.: US14923357Application Date: 2015-10-26
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Publication No.: US09932668B2Publication Date: 2018-04-03
- Inventor: Ravi Mullapudi , Harish Varma Penmethsa , Harshal T. Vasa , Srikanth Dasaradhi , Lee LeBlanc
- Applicant: Tango Systems, Inc.
- Applicant Address: US CA San Jose
- Assignee: Tango Systems Inc.
- Current Assignee: Tango Systems Inc.
- Current Assignee Address: US CA San Jose
- Agency: Patent Law Group LLP
- Agent Brand D. Ogonowsky
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/35 ; C23C14/50 ; C23C14/54 ; H01J37/34 ; H01J37/32

Abstract:
A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
Public/Granted literature
- US20170114448A1 PHYSICAL VAPOR DEPOSITION SYSTEM USING BACKSIDE GAS COOLING OF WORKPIECES Public/Granted day:2017-04-27
Information query
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