Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing same
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Application No.: US15225275Application Date: 2016-08-01
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Publication No.: US09911752B2Publication Date: 2018-03-06
- Inventor: Takayuki Kashima , Masahiro Fukuda , Takashi Hirotani
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L29/788 ; H01L29/792 ; H01L21/04 ; H01L27/11582 ; H01L21/02 ; H01L21/306 ; H01L21/308

Abstract:
According to one embodiment, a semiconductor memory device includes a semiconductor substrate, a stacked body provided on the semiconductor substrate and including a plurality of electrode films being disposed to be separated from each other along a vertical direction, a first semiconductor member provided inside the stacked body and contacting the semiconductor substrate, a second semiconductor member provided on the first semiconductor member inside the stacked body, contacting the first semiconductor member and extending in the vertical direction, and an insulating film provided between the second semiconductor member and the electrode films. A configuration of a contact surface between the first semiconductor member and the second semiconductor member is convex downward.
Public/Granted literature
- US20170271355A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2017-09-21
Information query
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