Invention Grant
- Patent Title: Methods and apparatus for SRAM cell structure
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Application No.: US15135185Application Date: 2016-04-21
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Publication No.: US09911744B2Publication Date: 2018-03-06
- Inventor: Jhon-Jhy Liaw
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/41 ; H01L27/11 ; G11C11/412 ; H01L27/02 ; G06F17/50 ; H01L27/092

Abstract:
An SRAM cell structure. In one embodiment, a bit cell first level contacts formed at a first and a second CVdd node, a first and a second CVss node, at a bit line node, at a bit line bar node, at a data node and at a data bar node; and second level contacts formed on each of the first level contacts at the first and second CVdd nodes, the first and second CVss nodes, the bit line node and the bit line bar node; wherein the first level contacts formed at the data node and the data bar node do not have a second level contact formed thereon. In another embodiment, a word line is formed and bit lines and a CVdd and a CVss line are formed overlying the SRAM cell and coupled to the corresponding ones of the nodes. Methods are disclosed for forming the cell structure.
Public/Granted literature
- US20160240541A1 Methods and Apparatus for SRAM Cell Structure Public/Granted day:2016-08-18
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