Invention Grant
- Patent Title: Selective deposition of thin film dielectrics using surface blocking chemistry
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Application No.: US15142497Application Date: 2016-04-29
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Publication No.: US09911591B2Publication Date: 2018-03-06
- Inventor: David Thompson , Mark Saly , Bhaskar Jyoti Bhuyan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/02 ; C23C16/455 ; C23C16/04 ; C23C16/50 ; H01L21/311 ; H01L21/67 ; C07F7/00 ; H01L21/3105 ; H01L21/32
Abstract:
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface. Methods include soaking a substrate surface comprising hydroxyl-terminations with a silylamine to form silyl ether-terminations and depositing a film onto a surface other than the silyl ether-terminated surface.
Public/Granted literature
- US20160322213A1 Selective Deposition Of Thin Film Dielectrics Using Surface Blocking Chemistry Public/Granted day:2016-11-03
Information query
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