Invention Grant
- Patent Title: Scanning probe lithography methods utilizing an enclosed sinusoidal pattern
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Application No.: US15235717Application Date: 2016-08-12
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Publication No.: US09911574B2Publication Date: 2018-03-06
- Inventor: Nan Yao , Wei Cai
- Applicant: The Trustees of Princeton University, Office of Technology and Trademark Licensing
- Applicant Address: US NJ Princeton
- Assignee: The Trustees of Princeton University, Office of Technology and Trademark Licensing
- Current Assignee: The Trustees of Princeton University, Office of Technology and Trademark Licensing
- Current Assignee Address: US NJ Princeton
- Agency: Moser Taboada
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/28 ; H01J37/317
Abstract:
Provided among other things are a scanning electron microscope, scanning transmission electron microscope, focused ion beam microscope, ion beam micromachining device, or scanning probe nanofabrication device, wherein the microscope or device is configured to move a substrate and a scanning modality relative to one another with an enclosed sinusoidal trajectory, and methods of operation.
Public/Granted literature
- US20170047199A1 SCANNING PROBE LITHOGRAPHY METHODS Public/Granted day:2017-02-16
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