Invention Grant
- Patent Title: Method of fabrication polymer waveguide
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Application No.: US14715039Application Date: 2015-05-18
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Publication No.: US09910217B2Publication Date: 2018-03-06
- Inventor: Chun-Hao Tseng , Wan-Yu Lee , Hai-Ching Chen , Tien-I Bao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G02B6/13
- IPC: G02B6/13 ; G02B6/12 ; G02B6/138 ; G02B6/132 ; G02B6/136 ; F21V8/00 ; G02B6/42

Abstract:
A method of fabricating a waveguide device is disclosed. The method includes providing a substrate having an elector-interconnection region and a waveguide region and forming a patterned dielectric layer and a patterned redistribution layer (RDL) over the substrate in the electro-interconnection region. The method also includes bonding the patterned RDL to a vertical-cavity surface-emitting laser (VCSEL) through a bonding stack. A reflecting-mirror trench is formed in the substrate in the waveguide region, and a reflecting layer is formed over a reflecting-mirror region inside the waveguide region. The method further includes forming and patterning a bottom cladding layer in a wave-tunnel region inside the waveguide region and forming and patterning a core layer and a top cladding layer in the waveguide region.
Public/Granted literature
- US20150253500A1 Method of Fabrication Polymer Waveguide Public/Granted day:2015-09-10
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