Invention Grant
- Patent Title: Laser processing of superconductor layers
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Application No.: US15415071Application Date: 2017-01-25
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Publication No.: US09887342B2Publication Date: 2018-02-06
- Inventor: Connie P. Wang , Paul Murphy , Paul Sullivan , Sukti Chatterjee
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01L39/12
- IPC: H01L39/12 ; H01L39/24
Abstract:
A method of forming a superconductor includes exposing a layer disposed on a substrate to an oxygen ambient, and selectively annealing a portion of the layer to form a superconducting region within the layer.
Public/Granted literature
- US20170133575A1 LASER PROCESSING OF SUPERCONDUCTOR LAYERS Public/Granted day:2017-05-11
Information query
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