Invention Grant
- Patent Title: Plasma treatment on metal-oxide TFT
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Application No.: US15001156Application Date: 2016-01-19
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Publication No.: US09887277B2Publication Date: 2018-02-06
- Inventor: Soo Young Choi , Beom Soo Park , Yi Cui , Tae Kyung Won , Dong-kil Yim
- Applicant: Applied Materials, Inc.
- Applicant Address: unknown Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: unknown Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L23/31 ; H01L29/66 ; H01L29/786
Abstract:
Techniques are disclosed for methods of post-treating an etch stop or a passivation layer in a thin film transistor to increase the stability behavior of the thin film transistor.
Public/Granted literature
- US20160218000A1 PLASMA TREATMENT ON METAL-OXIDE TFT Public/Granted day:2016-07-28
Information query
IPC分类:
