An immersion-type exposure apparatus includes a measurement area for measuring a substrate, an exposure area, which differs from the measurement area, for exposing the substrate via a projection optical system, plural stages configured to hold the substrate and to be movable between the exposure area and the measurement area, and a controller configured to control the driving of the plural stages, wherein in a case that one stage of the plural stage is positioned in the exposure area, and immersion liquid that is supplied onto the one stage is retained in exposure area and delivered to another stage, the controller is configured to determine a delivery position of the immersion liquid for the other stage based on at least a first processing position of the other stage.