Invention Grant
- Patent Title: Systems and methods of EUV mask cleaning
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Application No.: US14811919Application Date: 2015-07-29
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Publication No.: US09885952B2Publication Date: 2018-02-06
- Inventor: Ching-Wei Shen , Chi-Lun Lu , Kuan-Wen Lin
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: B08B3/12
- IPC: B08B3/12 ; G03F1/82

Abstract:
A system includes a bracket that is configured to support a photomask and is located at a first side of the photomask; an acoustic energy generator configured to generate acoustic energy, wherein the acoustic energy includes mechanical vibrations of a megasonic frequency and wavelength; and a fluid dispenser coupled to the acoustic energy generator such that the acoustic energy generated by the acoustic energy generator is received by the fluid dispenser to generate an acoustically agitated fluid stream directed at a second side of the photomask, wherein the first side of the photomask is opposite a second side of the photomask, and wherein the first side includes a pattern.
Public/Granted literature
- US20170031241A1 Systems and Methods of EUV Mask Cleaning Public/Granted day:2017-02-02
Information query
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