Invention Grant
- Patent Title: Inspection apparatus and adjusting method
-
Application No.: US14758054Application Date: 2013-12-19
-
Publication No.: US09885670B2Publication Date: 2018-02-06
- Inventor: Takahiro Jingu
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-003961 20130111
- International Application: PCT/JP2013/084156 WO 20131219
- International Announcement: WO2014/109205 WO 20140717
- Main IPC: G01N21/93
- IPC: G01N21/93 ; G01N21/956 ; G01N21/95

Abstract:
An inspection apparatus which can be accurately calibrated regardless of a use environment or an amount of use time is implemented. A reference substrate 100 provided with a diffraction grating 107 is mounted on a transport system 110, an illumination region 106 is formed on the diffraction grating 107 by light 105 from an illumination optical system 104, reflected light is collected by a detection optical system 108, and an output value from a sensor 111 is measured. It is determined whether or not a difference between a simulation value preserved in a processing section 112 and the output value from the sensor 111 is within a predetermined allowable range, and the optical system is adjusted so that the difference enters the allowable range. Since standard data for performing calibration on the inspection apparatus is obtained by using the diffraction grating, it is possible to implement the inspection apparatus which can be accurately calibrated regardless of a use environment or an amount of use time.
Public/Granted literature
- US20150346112A1 Inspection Apparatus and Adjusting Method Public/Granted day:2015-12-03
Information query