Invention Grant
- Patent Title: Methods for inspecting semiconductor wafers
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Application No.: US14411915Application Date: 2013-07-05
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Publication No.: US09885662B2Publication Date: 2018-02-06
- Inventor: Thorsten Trupke , Juergen Weber
- Applicant: BT Imaging Pty Ltd
- Applicant Address: AU New South Wales
- Assignee: BT IMAGING PTY LTD
- Current Assignee: BT IMAGING PTY LTD
- Current Assignee Address: AU New South Wales
- Agency: Mattingly & Malur, PC
- Priority: AU2012902891 20120706
- International Application: PCT/AU2013/000731 WO 20130705
- International Announcement: WO2014/005185 WO 20140109
- Main IPC: G01J3/00
- IPC: G01J3/00 ; G01N21/64 ; G01N21/95 ; G01R31/265

Abstract:
Methods and systems are presented for analyzing semiconductor materials as they progress along a production line, using photoluminescence images acquired using line-scanning techniques. The photoluminescence images can be analyzed to obtain spatially resolved information on one or more properties of said material, such as lateral charge carrier transport, defects and the presence of cracks. In one preferred embodiment the methods and systems are used to obtain series resistance images of silicon photovoltaic cells without making electrical contact with the sample cell.
Public/Granted literature
- US20150168303A1 METHODS FOR INSPECTING SEMICONDUCTOR WAFERS Public/Granted day:2015-06-18
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