Invention Grant
- Patent Title: Integral vasculature
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Application No.: US14310071Application Date: 2014-06-20
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Publication No.: US09884437B2Publication Date: 2018-02-06
- Inventor: David Mathew Johnson , Corie Lynn Cobb , John Steven Paschkewitz
- Applicant: Palo Alto Research Center Incorporated
- Applicant Address: US CA Palo Alto
- Assignee: PALO ALTO RESEARCH CENTER INCORPORATED
- Current Assignee: PALO ALTO RESEARCH CENTER INCORPORATED
- Current Assignee Address: US CA Palo Alto
- Agency: Fay Sharpe LLP
- Main IPC: B29C39/22
- IPC: B29C39/22 ; B29C39/14 ; B29C39/36 ; B29C39/00 ; B29C41/00 ; B29C41/28 ; B29C41/36 ; B29K63/00 ; B29K101/00 ; B29K105/00 ; B29L9/00 ; B29L31/30

Abstract:
A system and method is provided for creating a structure including a vasculature network. A film deposition device is configured to dispense droplets onto a surface of a substrate to form a curable fugitive pre-patterned liquid film on the surface of the substrate. An electrohydrodynamic film patterning (EHD-FP) device has a patterned electrode structure formed to generate an electric field and to subject the film on the surface of the substrate to the electric field. The film thereby being formed by the EHD-FP into patterned features in response to being subjected to the electric field. Then a casting system is configured to cover the patterned features in an epoxy to form patterned structures, wherein the patterned structures comprise a fugitive vasculature structure.
Public/Granted literature
- US20150367540A1 INTEGRAL VASCULATURE Public/Granted day:2015-12-24
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