Invention Grant
- Patent Title: Polishing pad and method for making the same
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Application No.: US14872370Application Date: 2015-10-01
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Publication No.: US09884400B2Publication Date: 2018-02-06
- Inventor: Chung-Chih Feng , I-Peng Yao , Wen-Chieh Wu , Hsin-Ru Song
- Applicant: San Fang Chemical Industry Co., Ltd.
- Applicant Address: TW Kaohsiung
- Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD
- Current Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD
- Current Assignee Address: TW Kaohsiung
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Priority: TW104100992A 20150112
- Main IPC: B24B37/20
- IPC: B24B37/20 ; B24D3/28 ; B24D18/00
Abstract:
The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.
Public/Granted literature
- US20160199961A1 POLISHING PAD AND METHOD FOR MAKING THE SAME Public/Granted day:2016-07-14
Information query
