Invention Grant
- Patent Title: SiC ingot slicing method
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Application No.: US14850239Application Date: 2015-09-10
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Publication No.: US09884389B2Publication Date: 2018-02-06
- Inventor: Kazuya Hirata , Yoko Nishino
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2014-187496 20140916
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/082 ; B28D5/00 ; B23K26/53 ; H01L31/00 ; H01L21/02 ; B23K26/70 ; B23K103/00 ; B23K101/40

Abstract:
Disclosed herein is an SiC ingot slicing method including: an initial separation layer formation step for scanning a focal point of a laser beam parallel to an end face of the SiC ingot along a scheduled separation plane, and forming a separation layer at a position at a distance from the end face; a repetition step for sequentially moving, after the initial separation layer formation step, the focal point by the distance equal to the thickness of an SiC plate from the separation layer toward the end face, scanning the focal point parallel to the end face, repeating the formation of the separation layer, and forming the plurality of separation layers; and a separation step for applying an external force to the plurality of separation layers formed by the repetition step, peeling off the SiC plates starting from the separation layers, and acquiring the plurality of SiC plates.
Public/Granted literature
- US20160074960A1 SiC INGOT SLICING METHOD Public/Granted day:2016-03-17
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