Invention Grant
- Patent Title: Multilayer laminated substrate structure
-
Application No.: US15096257Application Date: 2016-04-11
-
Publication No.: US09756721B2Publication Date: 2017-09-05
- Inventor: Jia-Liang Chen , Ting-Ju Lin , Ling-Chih Chou
- Applicant: GLOBAL UNICHIP CORPORATION , TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu TW Hsinchu
- Assignee: GLOBAL UNICHIP CORPORATION,TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: GLOBAL UNICHIP CORPORATION,TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu TW Hsinchu
- Agency: CKC Partners Co., Ltd.
- Priority: CN201510979103 20151223
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/11

Abstract:
A multilayer laminated substrate structure includes plural substrate layers stacked with each other, and a conductive via portion. One of the substrate layers is provided with a through hole. The conductive via portion includes a first signal conductive pad having a first rib, a second signal conductive pad having a second rib, and a conductive body which is disposed in the through hole and is electrically connected to the first rib and the second rib. The first signal conductive pad and the second signal conductive pad are disposed on two opposite surfaces of the substrate layer, and the first rib and the second rib are arranged in a staggered manner in relation to each other.
Public/Granted literature
- US20170188452A1 MULTILAYER LAMINATED SUBSTRATE STRUCTURE Public/Granted day:2017-06-29
Information query