Invention Grant
- Patent Title: Rectifier structures with low leakage
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Application No.: US15196776Application Date: 2016-06-29
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Publication No.: US09755045B2Publication Date: 2017-09-05
- Inventor: King-Yuen Wong , Chen-Ju Yu , Jiun-Lei Jerry Yu , Po-Chih Chen , Fu-Wei Yao , Fu-Chih Yang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/20 ; H01L21/265 ; H01L21/311 ; H01L21/306 ; H01L21/308 ; H01L29/423 ; H01L29/40 ; H01L21/28 ; H01L29/778 ; H01L21/8252 ; H01L27/06 ; H01L21/266 ; H01L21/3065 ; H01L29/417

Abstract:
An integrated circuit device includes a first III-V compound layer, a second III-V compound layer over the first III-V compound layer, a gate dielectric over the second III-V compound layer, and a gate electrode over the gate dielectric. An anode electrode and a cathode electrode are formed on opposite sides of the gate electrode. The anode electrode is electrically connected to the gate electrode. The anode electrode, the cathode electrode, and the gate electrode form portions of a rectifier.
Public/Granted literature
- US20160308024A1 Rectifier Structures with Low Leakage Public/Granted day:2016-10-20
Information query
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