Invention Grant
- Patent Title: Method and apparatus of diagnosing plasma in plasma space
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Application No.: US14200318Application Date: 2014-03-07
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Publication No.: US09754770B2Publication Date: 2017-09-05
- Inventor: Kyung-Yub Jeon , Jeong-Yun Lee , Chin-Wook Chung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do KR Seoul
- Assignee: Samsung Electronics Co., Ltd.,Industry-University Cooperation Foundation Hanyang University
- Current Assignee: Samsung Electronics Co., Ltd.,Industry-University Cooperation Foundation Hanyang University
- Current Assignee Address: KR Gyeonggi-do KR Seoul
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2013-0025384 20130311
- Main IPC: G01N27/62
- IPC: G01N27/62 ; G01R31/00 ; H01J37/32

Abstract:
To diagnose plasma in a plasma space, a plurality of floating probes are installed at a plurality of points, respectively, in a plasma space. An electron density ratio at each of the points is calculated by measuring a first probe current of each of the floating probes, the probe current including a DC component. A point ion density and a point electron temperature at each of the points are calculated by measuring a second probe current of each of the floating probes before the electron density ratio is calculated, the second probe current excluding the DC component.
Public/Granted literature
- US20140253092A1 METHOD AND APPARATUS OF DIAGNOSING PLASMA IN PLASMA SPACE Public/Granted day:2014-09-11
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