Invention Grant
- Patent Title: High electron mobility transistor structure
-
Application No.: US14855460Application Date: 2015-09-16
-
Publication No.: US09728613B2Publication Date: 2017-08-08
- Inventor: Fu-Wei Yao , Chun-Wei Hsu , Chen-Ju Yu , Jiun-Lei Jerry Yu , Fu-Chih Yang , Chih-Wen Hsiung , King-Yuen Wong
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/40 ; H01L29/778 ; H01L29/20

Abstract:
A transistor includes a first layer over a substrate. The transistor also includes a second layer over the first layer. The transistor further includes a carrier channel layer at an interface of the first layer and the second layer. The transistor additionally includes a gate structure, a drain, and a source over the second layer. The transistor also includes a passivation material in the second layer between an edge of the gate structure and an edge of the drain in a top-side view. The carrier channel layer has a smaller surface area than the first layer between the edge of the gate structure and the edge of the drain in the top-side view.
Public/Granted literature
- US20160005823A1 HIGH ELECTRON MOBILITY TRANSISTOR STRUCTURE AND METHOD OF MAKING THE SAME Public/Granted day:2016-01-07
Information query
IPC分类: