Invention Grant
- Patent Title: Block copolymer, method of forming the same, and method of forming pattern
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Application No.: US14962183Application Date: 2015-12-08
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Publication No.: US09725550B2Publication Date: 2017-08-08
- Inventor: Min Hyuck Kang , Su Mi Lee , Myung Im Kim , Tae Woo Kim , Seung-Won Park , Xie Lei , Na Na Kang , Bong-Jin Moon , Joona Bang , Sang Hoon Woo , Jin Yeong Lee , Hyun Jung Jung , June Huh
- Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION , Sogang University Research Foundation
- Applicant Address: KR Yongin-si, Seoul KR Seoul KR Seoul
- Assignee: Samsung Display Co., Ltd.,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION,SOGANG UNIVERSITY RESEARCH FOUNDATION
- Current Assignee: Samsung Display Co., Ltd.,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION,SOGANG UNIVERSITY RESEARCH FOUNDATION
- Current Assignee Address: KR Yongin-si, Seoul KR Seoul KR Seoul
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0003439 20130111
- Main IPC: C08F299/02
- IPC: C08F299/02 ; C08F293/00 ; C08G61/08 ; C08F299/00

Abstract:
A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
Public/Granted literature
- US20160090435A1 BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN Public/Granted day:2016-03-31
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