Invention Grant
- Patent Title: Method for forming a glass substrate with a depleted surface layer and polycrystalline-silicon TFT built thereon
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Application No.: US14787394Application Date: 2014-04-25
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Publication No.: US09722084B2Publication Date: 2017-08-01
- Inventor: Ta-Ko Chuang , Yunfeng Gu , Robert George Manley
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Kevin M. Abie
- International Application: PCT/US2014/035428 WO 20140425
- International Announcement: WO2014/179163 WO 20141106
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66 ; C03C23/00 ; C03C25/66 ; C03C25/70 ; H01L21/02 ; H01L21/28 ; H01L21/3213 ; H01L21/324 ; H01L21/768 ; H01L29/04 ; H01L29/16 ; H01L29/49 ; H01L29/51

Abstract:
There is disclosed a method for chemically treating a display glass substrate by treating at least one surface of the glass substrate with a heated solution containing HCl to form a depletion layer at the surface and under the surface of the glass substrate. The disclosure also relates to display glass substrates containing the depletion layer made by the disclosed process. In addition, the disclosure relates to methods of making thin-film transistors (“TFTs”) on these display glass substrates by depositing a Si layer directly on the chemically treated surface of the glass substrate, and annealing the Si layer to form polycrystalline silicon.
Public/Granted literature
- US20160071981A1 GLASS WITH DEPLETED LAYER AND POLYCRYSTALLINE-SILICON TFT BUILT THEREON Public/Granted day:2016-03-10
Information query
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