- Patent Title: Pattern generation method for generating cell pattern including pattern element and assist pattern, recording medium, information processing apparatus, and mask fabrication method
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Application No.: US14558256Application Date: 2014-12-02
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Publication No.: US09696618B2Publication Date: 2017-07-04
- Inventor: Ryo Nakayama
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2013-250398 20131203
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/38

Abstract:
A method for generating a pattern including patterns of cells having assist patterns arranged therein. The present invention provides a method for generating a pattern of a cell used when a mask pattern is generated by arranging cells selected from among a plurality of types of cells. The method includes generating a pattern including isolated rectangular pattern elements and an assist pattern as a cell pattern by obtaining data on a cell including the rectangular pattern elements and generating the assist pattern which assist resolution of the rectangular pattern elements in accordance with the data.
Public/Granted literature
Information query