Pattern generation method for generating cell pattern including pattern element and assist pattern, recording medium, information processing apparatus, and mask fabrication method
Abstract:
A method for generating a pattern including patterns of cells having assist patterns arranged therein. The present invention provides a method for generating a pattern of a cell used when a mask pattern is generated by arranging cells selected from among a plurality of types of cells. The method includes generating a pattern including isolated rectangular pattern elements and an assist pattern as a cell pattern by obtaining data on a cell including the rectangular pattern elements and generating the assist pattern which assist resolution of the rectangular pattern elements in accordance with the data.
Information query
Patent Agency Ranking
0/0